Electrolytic gold deposition on dodecanethiol-Modified gold films

Langmuir

Volumn 25, Issue 9, 2009, Pages 5031-5038

  Pattanaik, Gyana ^a   Shao, Wenbo ^a   Swami, Nathan ^b   Zangari, Giovanni ^a  

^a Dept of Materials Science and Engineering and Center for Electrochemical Science and Engineering ^*  (United States)

^b University of Virginia   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALTERNATIVE METHODS; APPLIED POTENTIALS; AU FILM; AU SURFACES; COMPETITION PROCESS; DEFECT SITES; DIFFUSION LIMITED; DODECANETHIOL; DODECANETHIOL MONOLAYERS; ELECTROCHEMICAL GROWTH; ELECTROCHEMICAL NUCLEATION; FILM MORPHOLOGY; GOLD DEPOSITION; GOLD FILM; HIGH OVERVOLTAGES; METAL GROWTH; OVER POTENTIAL; OVER-VOLTAGES; PROGRESSIVE NUCLEATION; SELF-ASSEMBLED;

CHRONOAMPEROMETRY; DENDRIMERS; ELECTRON ENERGY LEVELS; FILM GROWTH; GOLD DEPOSITS; GRAIN BOUNDARIES; NUCLEATION; SELF ASSEMBLED MONOLAYERS; SOIL CONSERVATION;

GOLD;

EID: 66549095962     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la803907p     Document Type: Article

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