Octadecanethiol SAMs as molecular resists for electrodeposition of cobalt

Journal of Physical Chemistry C

Volumn 111, Issue 24, 2007, Pages 8686-8691

  O'Brien, Brigid ^a   Stebe, Kathleen J ^a,b   Searson, Peter C ^a  

^a Johns Hopkins University   (United States)

^b Department of Chemical and Biomolecular Engineering ^*

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION POTENTIAL; MOLECULAR RESISTS;

CONCENTRATION (PROCESS); DEPOSITION RATES; ELECTRODEPOSITION; MONOLAYERS;

COBALT;

EID: 34547382294     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp072176u     Document Type: Article

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