메뉴 건너뛰기




Volumn 6, Issue 5, 2006, Pages 1023-1026

Fabrication of complex architectures using electrodeposition into patterned self-assembled monolayers

Author keywords

[No Author keywords available]

Indexed keywords

COMPLEX STRUCTURES; FINITE SIZE EFFECTS; SOLID SURFACES;

EID: 33744790928     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl060368f     Document Type: Article
Times cited : (43)

References (14)
  • 1
    • 21544461322 scopus 로고
    • Generation of electrochemically deposited metal patterns by means of electron-beam (nano)lithography of self-assembled monolayer resists
    • Sondag-Huethorst, J. A. M.: Vanhelleputte, H. R. J.; Fokkink, L. G. J. Generation of Electrochemically Deposited Metal Patterns by Means of Electron-Beam (Nano)Lithography of Self-Assembled Monolayer Resists. Appl. Phys. Lett. 1994, 64 (3). 285-287.
    • (1994) Appl. Phys. Lett. , vol.64 , Issue.3 , pp. 285-287
    • Sondag-Huethorst, J.A.M.1    Vanhelleputte, H.R.J.2    Fokkink, L.G.J.3
  • 2
    • 0035851480 scopus 로고    scopus 로고
    • Electrode modification by electron-induced patterning of aromatic self-assembled monolayers
    • Felgenhauer, T.; Van, C; Geyer, W.; Rong, H. T.; Golzhauser, A.; Buck, M. Electrode modification by electron-induced patterning of aromatic self-assembled monolayers. Appl. Phys. Lett. 2001, 79 (20), 3323-3325.
    • (2001) Appl. Phys. Lett. , vol.79 , Issue.20 , pp. 3323-3325
    • Felgenhauer, T.1    Van, C.2    Geyer, W.3    Rong, H.T.4    Golzhauser, A.5    Buck, M.6
  • 3
  • 4
    • 0007054106 scopus 로고
    • Use of the laser-desorption technique for the preparation of a mixed-thiol monolayer on a gold electrode
    • Takehara, K.; Yamada, S.; Ide, Y. Use of the Laser-Desorption Technique for the Preparation of a Mixed-Thiol Monolayer on a Gold Electrode. J. Electroanal. Chem. 1992, 333 (1-2), 339-344.
    • (1992) J. Electroanal. Chem. , vol.333 , Issue.1-2 , pp. 339-344
    • Takehara, K.1    Yamada, S.2    Ide, Y.3
  • 5
    • 0000307032 scopus 로고    scopus 로고
    • Photochemistry and patterning of self-assembled monolayer films containing aromatic hydrocarbon functional groups
    • Dulcey, C. S.; Georger, J. H.; Chen, M. S.; McElvany, S. W.; OFerrall, C. E.; Benezra, V. I.; Calvert, J. M. Photochemistry and patterning of self-assembled monolayer films containing aromatic hydrocarbon functional groups. Langmuir 1996, 12 (6), 1638-1650.
    • (1996) Langmuir , vol.12 , Issue.6 , pp. 1638-1650
    • Dulcey, C.S.1    Georger, J.H.2    Chen, M.S.3    McElvany, S.W.4    Oferrall, C.E.5    Benezra, V.I.6    Calvert, J.M.7
  • 6
    • 0001293248 scopus 로고
    • Patterning of selfAssembled alkanethiol monolayers on silver by microfocus ion and electron-beam bombardment
    • Gillen, G.; Wight, S.; Bennett, J.; Tarlov, M. J. Patterning of SelfAssembled Alkanethiol Monolayers on Silver by Microfocus Ion and Electron-Beam Bombardment. Applied Physics Lett. 1994, 65 (5), 534-536.
    • (1994) Applied Physics Lett. , vol.65 , Issue.5 , pp. 534-536
    • Gillen, G.1    Wight, S.2    Bennett, J.3    Tarlov, M.J.4
  • 7
    • 0035128088 scopus 로고    scopus 로고
    • Characterization of X-ray induced damage in alkanethiolate monolayers by high-resolution photoelectron spectroscopy
    • Heister, K.; Zhamikov, M.; Grunze, M.; Johansson, L. S. O.; Ulman, A. Characterization of X-ray induced damage in alkanethiolate monolayers by high-resolution photoelectron spectroscopy. Langmuir 2001, 17(1), 8-11.
    • (2001) Langmuir , vol.17 , Issue.1 , pp. 8-11
    • Heister, K.1    Zhamikov, M.2    Grunze, M.3    Johansson, L.S.O.4    Ulman, A.5
  • 9
    • 0001211583 scopus 로고    scopus 로고
    • Electron-induced cross-linking of aromatic self-assembled monolayers: Negative resists for nanolithography
    • Geyer, W.; Stadier, V.; Eck, W.; Zhamikov, M.; Golzhauser, A.; Grunze, M. Electron-induced cross-linking of aromatic self-assembled monolayers: Negative resists for nanolithography. Appl. Phys. Lett. 1999, 75(16), 2401-2403.
    • (1999) Appl. Phys. Lett. , vol.75 , Issue.16 , pp. 2401-2403
    • Geyer, W.1    Stadier, V.2    Eck, W.3    Zhamikov, M.4    Golzhauser, A.5    Grunze, M.6
  • 10
    • 0029406944 scopus 로고
    • Patterned metal electrodeposition using an alkanethiolate mask
    • Moffat, T. P.; Yang, H. Patterned Metal Electrodeposition Using an Alkanethiolate Mask. J. Electrochem. Soc. 1995, 142 (11), L220-L222.
    • (1995) J. Electrochem. Soc. , vol.142 , Issue.11
    • Moffat, T.P.1    Yang, H.2
  • 11
    • 0000132662 scopus 로고
    • Patterning selfAssembled monolayers-applications in materials science
    • Kumar, A.; Biebuyck, H. A.; Whitesides, G. M. Patterning SelfAssembled Monolayers-Applications in Materials Science. Langmuir 1994, 10 (5), 1498-1511.
    • (1994) Langmuir , vol.10 , Issue.5 , pp. 1498-1511
    • Kumar, A.1    Biebuyck, H.A.2    Whitesides, G.M.3
  • 12
    • 24144493064 scopus 로고    scopus 로고
    • Site-selective patterning using surfactant-based resists
    • Pesika, N. S.; Fan, F. Q.; Searson, P. C.; Stehe, K. J. Site-selective patterning using surfactant-based resists. J. Am. Chem. Soc. 2005, 127 (34), 11960-11962.
    • (2005) J. Am. Chem. Soc. , vol.127 , Issue.34 , pp. 11960-11962
    • Pesika, N.S.1    Fan, F.Q.2    Searson, P.C.3    Stehe, K.J.4
  • 14
    • 2042469471 scopus 로고    scopus 로고
    • Electrodeposition of copper in the SPS-PEG-C1 additive system. I. Kinetic measurements: Influence of SPS
    • Moffat, T. P.; Wheeler, D.; Josell, D. Electrodeposition of copper in the SPS-PEG-C1 additive system. I. Kinetic measurements: Influence of SPS. J. Electrochem. Soc. 2004, 151 (4), C262-C271.
    • (2004) J. Electrochem. Soc. , vol.151 , Issue.4
    • Moffat, T.P.1    Wheeler, D.2    Josell, D.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.