메뉴 건너뛰기




Volumn 75, Issue 16, 1999, Pages 2401-2403

Electron-induced crosslinking of aromatic self-assembled monolayers: Negative resists for nanolithography

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0001211583     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.125027     Document Type: Article
Times cited : (286)

References (19)
  • 11
    • 0031055125 scopus 로고    scopus 로고
    • There is one example of SAMs containing polymerizable diacetylenic groups that has been used as a negative UV resist: T. Kim, K. C. Chan, and R. M. Crooks, J. Am. Chem. Soc. 119, 189 (1997).
    • (1997) J. Am. Chem. Soc. , vol.119 , pp. 189
    • Kim, T.1    Chan, K.C.2    Crooks, R.M.3
  • 13
    • 85034149774 scopus 로고    scopus 로고
    • note
    • 7/2 peak at 84.0 eV. NEXAFS spectra were recorded in partial yield (-150 V retardation potential) at the HE-TGM2 monochromator of the BESSY 1 electron synchrotron.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.