Proximity effect in electron-beam-induced deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 6 B, 2006, Pages 5517-5521

  Mitsuishi, Kazutaka ^a   Shimojo, Masayuki ^b   Takeguchi, Masaki ^a   Tanaka, Miyoko ^a   Furuya, Kazuo ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b SAITAMA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

CVD; Electron beam induced deposition; Nanofabrication

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON BEAMS; ELECTROSTATICS; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; SUBSTRATES;

CHARGE ACCUMULATION; ELECTRON-BEAM-INDUCED DEPOSITION; ELECTROSTATIC FORCES; RESOLUTION LIMITS;

DEPOSITION;

EID: 33745647869     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.5517     Document Type: Review

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