Focused electron-Beam-induced deposition of 3 nm dots in a scanning electron microscope

Nano Letters

Volumn 9, Issue 5, 2009, Pages 2149-2152

  Ven Kouwen, Leon ^a   Botman, Aurelien ^a   Hagen, Cornelis W ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM-INDUCED DEPOSITION; FABRICATED STRUCTURES; FOCUSED ELECTRON BEAMS; FULL WIDTH HALF MAXIMUM; INDIRECT METHODS; NANO-DEVICES; NANODOT; SCANNING ELECTRON MICROSCOPE; SEM;

ELECTRONS; NANOSTRUCTURED MATERIALS; SCANNING; SCANNING ELECTRON MICROSCOPY;

MICROSCOPES;

EID: 66449115768     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl900717r     Document Type: Article

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