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Volumn 190, Issue 1, 2005, Pages 25-31

Supercritical fluid immersion deposition: A new process for selective deposition of metal films on silicon substrates

Author keywords

Copper; Immersion deposition; Palladium; Palladium silicide; Silicon substrates; Supercritical CO2

Indexed keywords

PALLADIUM COMPOUNDS; SILICON; SOLUTIONS; SOLVENTS; SUBSTRATES;

EID: 8144220467     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.06.023     Document Type: Article
Times cited : (16)

References (57)
  • 53
    • 8144224348 scopus 로고
    • U.S. Patent 5,358,907
    • K.H. Wong, U.S. Patent 5,358,907, 1994.
    • (1994) , vol.358 , pp. 907
    • Wong, K.H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.