SCOPUS 정보 검색 플랫폼

Volumn 496, Issue 3, 2002, Pages 287-298

A structure study of the electroless deposition of Au on Si(1 1 1):H

(10) Warren, S a Reitzle, A b Kazimirov, A c Ziegler, J C b Bunk, O d Cao, L X a Renner, F U a Kolb, D M b Bedzyk, M J e,f Zegenhagen, J a

a EUROPEAN SYNCHROTRON RADIATION FACILITY (France)

b UNIVERSITY OF ULM (Germany)

c Department of Molecular Biology and Genetics (United States)

d UNIVERSITY OF HAMBURG (Germany)

e Northwestern University (United States)

f ARGONNE NATIONAL LABORATORY (United States)

Author keywords

Electrochemical methods; Epitaxy; Gold; Silicon; Single crystal surfaces; Solid liquid interfaces; X ray scattering, diffraction, and reflection; X ray standing waves

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTROLESS PLATING; EPITAXIAL GROWTH; MONOLAYERS; PHASE INTERFACES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; SINGLE CRYSTALS; SURFACE STRUCTURE; WETTING; X RAY DIFFRACTION ANALYSIS; X RAY SCATTERING;

CLUSTER FORMATION;

GOLD;

EID: 0037050251 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(01)01589-8 Document Type: Article

Times cited : (40)

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