A Study of Immersion Processes of Activating Polished Crystalline Silicon for Autocatalytic Electroless Deposition of Palladium and Other Metals

Journal of the Electrochemical Society

Volumn 146, Issue 2, 1999, Pages 580-584

  Karmalkar, S ^a   Banerjee, J ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY MADRAS   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; AMMONIUM COMPOUNDS; COMPOSITION EFFECTS; CRYSTALLINE MATERIALS; DOPING (ADDITIVES); ELECTRIC POTENTIAL; ETCHING; NUCLEATION; PALLADIUM; RATE CONSTANTS; SEMICONDUCTING SILICON; SILICA;

AUTOCATALYTIC ELECTROLESS DEPOSITION (AED);

ELECTROLESS PLATING;

EID: 0033075854     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391647     Document Type: Article

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