Metal deposition on n-Si(111):H electrodes

Electrochimica Acta

Volumn 45, Issue 28, 2000, Pages 4599-4605

  Ziegler, J C ^a   Reitzle, A ^a   Bunk, O ^b   Zegenhagen, J ^c   Kolb, D M ^a  

^a UNIVERSITY OF ULM   (Germany)

^b UNIVERSITY OF HAMBURG   (Germany)

^c EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COPPER; CRYSTAL SYMMETRY; DISSOLUTION; ELECTRIC CURRENTS; ELECTRODEPOSITION; EPITAXIAL GROWTH; GOLD; LEAD; NUCLEATION; SEMICONDUCTING SILICON; SURFACE ROUGHNESS;

VOLMER-WEBER GROWTH MODE;

ELECTROCHEMICAL ELECTRODES;

EID: 0034290906     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0013-4686(00)00611-3     Document Type: Article

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