Mechanism of the chemical deposition of nickel on silicon wafers in aqueous solution

Journal of the Electrochemical Society

Volumn 146, Issue 4, 1999, Pages 1407-1411

  Takano, Nao ^a   Hosoda, Naohiro ^a   Yamada, Taro ^a   Osaka, Tetsuya ^a  

^a WASEDA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSIS; CHEMICAL ANALYSIS; ELECTROLESS PLATING; ENERGY DISPERSIVE SPECTROSCOPY; NICKEL; NICKEL COMPOUNDS; PH; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

ELEMENTAL ANALYSIS; SODIUM CITRATE;

ELECTRODEPOSITION;

EID: 0032669507     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391778     Document Type: Article

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