(hfac)Cu(I)(MP) (hfac = hexafluoroacetylacetonate, MP = 4-methyl-1-pentene) and (hfac)Cu(I)(DMB) (DMB = 3,3-dimethyl-1-butene) for the chemical vapor deposition of copper film

Thin Solid Films

Volumn 350, Issue 1, 1999, Pages 10-13

  Kang, Sang Woo ^a   Han, Sang Ho ^b   Rhee, Shi Woo ^a  

^a Pohang Superconductivity Center   (South Korea)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; METALLIZING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OLEFINS; ORGANOMETALLICS; VAPORIZATION;

HEXAFLUOROACETYLACETONATE;

METALLIC FILMS;

EID: 0032631833     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00346-6     Document Type: Article

References (6)

1. Dubois L.H., Zegarski B.R. J. Electrochem. Soc. 139:1992;3295.
2. Park M.Y., Son J.H., Kang S.W., Rhee S.W. J. Mater. Res. 14(3):1999;975.
3. S.W. Kang, S.W. Rhee, J. Electrochem. Soc. (1999) submitted.
4. Yoen H.Y., Park Y.B., Rhee S.W. J. Mater. Sci. Mater. Electron. 8:1997;189.
5. Park M.Y., Son J.H., Rhee S.W. Electrochem. Solid-State Lett. 1:1998;32.
6. Kang S.W., Park M.Y., Rhee S.W. Electrochem. Solid-State Lett. 2:1999;22.