Dry release for surface micromachining with HF vapor-phase etching

Journal of Microelectromechanical Systems

Volumn 6, Issue 3, 1997, Pages 226-233

  Lee, Yong Il ^b,d,e   Park, Kyung Ho ^b,f,g,h,i   Lee, Jonghyun ^b,d   Lee, Chun Su ^b,d   Yoo, Hyung Joun ^b,d,h,j,k   Kim, Chang Jin ^a,c   Yoon, Yong San ^{d,j,k,l,m,n,o,p}  

^a IEEE   (United States)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

^c UNIVERSITY OF CALIFORNIA   (United States)

^d Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^e Hanyang University   (South Korea)

^f Kyungpook National University   (South Korea)

^g RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^h Agency for Defence Development   (South Korea)

ⁱ Basic Research Lab

^j Seoul National University   (South Korea)

^k Adv Technology Research Department

^l UNIVERSITY OF IOWA   (United States)

^m Korea Military Academy   (South Korea)

ⁿ BOSTON CHILDREN S HOSPITAL   (United States)

^o HOSPITAL FOR SPECIAL SURGERY   (United States)

^p ASME   (United States)

more..

Author keywords

Adhesion; Dry release; Stiction; Surface micromachining; Vapor phase etching

Indexed keywords

ADHESION; CONDENSATION; DRY ETCHING; FABRICATION; HYDROFLUORIC ACID; MIXTURES; OXIDES; SCANNING ELECTRON MICROSCOPY; SILICA; SUBSTRATES; SURFACES;

OPTICAL PROFILOMETER; SURFACE MICROMACHINING; VAPOR PHASE ETCHING; XENON DIFLUORIDE VAPOR;

MICROMACHINING;

EID: 0031235607     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.623111     Document Type: Article

References (25)

1. R. L. Alley, G. J. Cuan, R. T. Howe, and K. Komvopoulos, "The effect of release-etch processing on surface microstructure stiction," in Tech. Dig. IEEE Solid-State Sensor and Actuator Workshop, Hilton Head, SC, June 1992, pp. 202-207.
2. R. Legtenberg, J. Elders, and M. Elwenspoek, "Stiction of surface micromachined structures after rinsing and drying: Model and investigation of adhesion mechanisms," in Tech. Dig. 7th Int. Conf. Solid-State Sensors and Actuators (Transducers '93), Yokohama, Japan, June 1993, pp. 198-201.
3. C. H. Mastrangelo, and C. H. Hsu, "Mechanical stability and adhesion of microstructures under capillary forces - Part I: Basic theory," J. Microelectromechanical Systems, vol. 2, no. 1, pp. 33-43, Mar. 1993.
4. T. Abe, W. C. Messner, M. L. Reed, "Effects of elevated temperature treatments in microstructure release procedures," IEEE J. Microelectromech. Syst., vol. 4, no. 2, pp. 66-75, June 1995.
5. L.-S. Fan, Y.-C. Tai, and R. S. Muller, "IC-processed electrostatic micromotors," Sens. Actuators, vol. 20, nos. 1/2, pp. 41-47, 1989.
6. W. C. Tang, T.-C. H. Nguyen, and R. T. Howe, "Laterally driven polysilicon resonant microstructure," Sens. Actuators, vol. 20, nos. 1/2, pp. 25-32, 1989.
7. Y. Yee, K. Chun, J. D. Lee, and C.-J. Kim, "Polysilicon surface-modification technique to reduce sticking of microstructures," Sens. Actuators, vol. A52, nos. 1-3, pp. 145-150, Apr. 1996.
8. H. Guckel, J. J. Sniegowski, and T. R. Christenson, "Fabrication of micromechanical devices from poly-silicon films with smooth surfaces," Sens. Actuators, vol. 20, nos. 1/2, pp. 117-122, Nov. 1989.
9. N. Takeshima, K. J. Gabriel, M. Ozaki, J. Takahashi, H. Horiguchi, and H. Fujita, "Electrostatic parallelogram actuators," in Tech. Dig. Int. Conf. Solid-State Sensors and Actuators (Transducers '91), San Francisco, CA, June 1991, pp. 63-66.
10. D. Kobayashi, T. Hirano, T. Furuhata, and H. Fujita, "An integrated lateral tunneling unit," Proc. IEEE Micro Electro Mechanical Systems, Travemünde, Germany, Feb. 1992, pp. 214-219.
11. G. Lin, C.-J. Kim, S. Konishi, and H. Fujita, "Design, fabrication, and testing of a C-shape actuator," in Tech. Dig. 8th Int. Conf. Solid-State Sensors and Actuators (Transducers '95), Stockholm, Sweden, June 1995, pp. 416-419.
12. M. Orpana and A. O. Korhonen, "Control of residual stress of polysilicon thin films by heavy doping in surface micromachining," in Int. Conf. Solid-State Sensors and Actuators (Transducers '91), San Francisco, CA, June 1991, pp. 957-960.
13. G. T. Mulhern, D. S. Soane, and R. T. Howe, "Supercritical carbon dioxide drying of microstructures," in Tech. Dig. 7th Int. Conf. Solid-State Sensors and Actuators (Transducers 93), Yokohama, Japan, June 1993, pp. 296-299.
14. C.-J. Kim, A. P. Pisano, R. S. Muller, and M. G. Lim, "Polysilicon microgripper," Sens. Actuators, vol. A33, no. 3, pp. 221-227, 1992.
15. ppush C. H. Mastrangelo and G. S. Saloka, "A dry-release method based on polymer columns for microstructure fabrication," in Proc. IEEE Micro Electro Mechanical Systems, Fort Lauderdale, FL, Feb. 1993, pp. 77-81.
16. D. Kobayashi, C.-J. Kim, and H. Fujita, "Photoresist-assisted release of movable microstructures," Jpn. J. Appl. Phys., vol. 32, no. 11A, pp. L1642-L1644, Nov. 1993.
17. F. I. Chang, R. Yeh, G. Lin, P. B. Chu, E. Hoffman, E. J. J. Kruglick, K. S. J. Pister, and M. H. Hecht, "Gas-phase silicon micromachining with Xenon Difluoride," in Proc. SPIE Microelectronic Structures and Microelectromechanical Devices for Optical Processing and Multimedia Applications, Austin, TX, Oct. 1995, pp. 117-128.
18. J. H. Lee, K. H Park, C. S. Lee, J. T. Baek, C.-J. Kim, and H. J. Yoo, "Fabrication of surface-micromachined polysilicon microactuators using HF gas-phase etching process," in Proc. MEMS (DSC-vol. 59), Symp. Micro-Mechanical Systems, ASME Int. Mechanical Engineering Congress and Exposition, Atlanta, GA, Nov. 1996, pp. 373-377.
19. Offenberg, B. Eisner, and F. Lärmer, "Vapor HF etching for sacrificial oxide removal in surface micromachining," in Electrochemical Soc. Fall Meet., vol. 94, no. 2, Oct. 1994, pp. 1056-1057.
20. J. Y. Kim and C.-J. Kim, "Comparative study of various release methods for polysilicon surface micromachining," in Proc. IEEE Micro Electro Mechanical Systems Workshop, Nagoya, Japan, Jan. 1997, pp. 442-447.
21. P. J. Holmes and J. E. Snell, Microelectron. Reliab., vol. 5, no. 4, pp. 337-341, Nov. 1966.
22. 3OH vapor," J. Electrochem. Soc., vol. 143, no. 3, pp. 1099-1103, Mar. 1996.
23. K. Torek, J. Ruzyllo, R. Grant, and R. Novak, "Reduced pressure etching of thermal oxide in anhydrous HF/alcoholic gas mixtures," J. Electrochem. Soc., vol. 142, no. 4, pp. 1322-1326, Apr. 1995.
24. Handbook of Chemistry and Physics, D. R. Lide, Ed. Boca Raton, FL: CRC, 1992.
25. M. R. Houston, R. Maboudian, and R. T. Howe, "Self-assembled monolayer films as durable anti-stiction coatings for polysilicon microstructures," in Tech. Dig. Solid-State Sensor and Actuator Workshop, Hilton Head, SC, June 1996, pp. 42-47.