Immersion deposition of metal films on silicon and germanium substrates in supercritical carbon dioxide

Chemistry of Materials

Volumn 15, Issue 1, 2003, Pages 83-91

  Ye, Xiang R ^a   Wai, Chien M ^a   Zhang, Daqing ^a   Kranov, Yanko ^a   McIlroy, David N ^a   Lin, Yuehe ^b   Engelhard, Mark ^b  

^a UNIVERSITY OF IDAHO   (United States)

^b PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE; COPPER; GERMANIUM DERIVATIVE; LEAD; METAL; SILICON; SILVER;

ARTICLE; CHELATION; FILM; GAS ANALYSIS; IMMERSION; LOW TEMPERATURE; OXIDATION; REACTION ANALYSIS; SUPERCRITICAL FLUID; SURFACE PROPERTY;

EID: 0037435549     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm011534h     Document Type: Article

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