Atmospheric plasma deposition process: A versatile tool for the design of tunable siloxanes-based plasma polymer films

Plasma Processes and Polymers

Volumn 8, Issue 10, 2011, Pages 895-903

  Petersen, Julien ^a,b   Bechara, Rony ^a   Bardon, Julien ^a   Fouquet, Thierry ^a   Ziarelli, Fabio ^d   Daheron, Laurence ^a   Ball, Vincent ^c   Toniazzo, Valérie ^a   Michel, Marc ^a   Dinia, Aziz ^b   Ruch, David ^a  

^a LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY   (Luxembourg)

^b UNIVERSITÉ DE STRASBOURG   (France)

^c INSERM   (France)

^d Aix Marseille University   (France)

Author keywords

atmospheric pressure discharge; hexamethyldisiloxane (HMDSO); NMR; Plasma polymerization; wettability

Indexed keywords

ANALYTICAL TOOL; ATMOSPHERIC PLASMA DEPOSITION; ATMOSPHERIC PRESSURE DISCHARGE; CHEMICAL COMPOSITIONS; HEXAMETHYL DISILOXANE; LOW-PLASMA ENERGY; PLASMA DIELECTRICS; PLASMA ENERGY; PLASMA PARAMETER; PLASMA POLYMER FILMS; POLYDIMETHYLSILOXANE PDMS; TWO DOMAINS; VERSATILE TOOLS;

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; DIELECTRIC DEVICES; ELECTRIC DISCHARGES; MICROCHANNELS; MOLECULAR STRUCTURE; MONOMERS; PLASMA DEPOSITION; PLASMA POLYMERIZATION; PLASMAS; PLASTIC FILMS; POLYMERS; SILICON COMPOUNDS; SILICONES;

POLYMER FILMS;

EID: 80054706915     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201100022     Document Type: Article

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