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Volumn 109, Issue 28, 2005, Pages 13605-13610

Density functional theory calculation of 29Si NMR chemical shifts of organosiloxanes

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL SHIFTS; HOT-FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD); ORGANOSILOXANES; REACTION CHEMISTRY;

EID: 23144436392     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp044385+     Document Type: Article
Times cited : (33)

References (52)
  • 28
    • 0002868841 scopus 로고
    • Plasma-polymerized organosilicones and organometallics
    • d'Agostino, R., Ed.; Academic Press: Boston
    • Wróbel, A. M.; Wertheimer, M. R. Plasma-polymerized organosilicones and organometallics. In Plasma deposition, treatment and etching of polymers; d'Agostino, R., Ed.; Academic Press: Boston, 1990; p 163.
    • (1990) Plasma Deposition, Treatment and Etching of Polymers , pp. 163
    • Wróbel, A.M.1    Wertheimer, M.R.2
  • 29
    • 0001816089 scopus 로고
    • 29Si-NMR spectroscopic results
    • Diehl, P., Fluck, E., Kosfeld, R., Eds.; Springer-Verlag: New York
    • 29Si-NMR Spectroscopic Results. In NMR: Oxygen-17 and Silicon-29; Diehl, P., Fluck, E., Kosfeld, R., Eds.; Springer-Verlag: New York, 1981; Vol. 17, p 65.
    • (1981) NMR: Oxygen-17 and Silicon-29 , vol.17 , pp. 65
    • Marsmann, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.