Gas separation properties of organosilicon plasma polymerized membranes

AIChE Journal

Volumn 45, Issue 7, 1999, Pages 1566-1575

  Roualdes, Stéphanie ^a   Van Der Lee, Arie ^a   Berjoan, René ^a,b   Sanchez, José ^a   Durand, Jean ^a  

^a UNIVERSITÉ DE MONTPELLIER   (France)

^b Centre National de la Recherche Scientifique   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYMERIC MEMBRANES; POLYMERIZATION; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SEPARATION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

GAS SEPARATION PROPERTIES; KNUDSEN LIKE SEPARATION FACTORS; PLASMA POLYMERIZED MEMBRANES;

METALLORGANIC POLYMERS;

GAS SEPARATION; PROPERTIES; SYNTHETIC MEMBRANE;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMICAL STRUCTURE; DENSITY; DIFFUSION; INFRARED SPECTROSCOPY; POLYMERIZATION; REFRACTION INDEX;

EID: 0032803947     PISSN: 00011541     EISSN: None     Source Type: Journal    
DOI: 10.1002/aic.690450718     Document Type: Article

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