Evaluation of deposition conditions to design plasma coatings like SiOx and a-C:H on polymers

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 253-260

  Hegemann, D ^a   Brunner, H ^a   Oehr, C ^a  

^a FRAUNHOFER GESELLSCHAFT   (Germany)

Author keywords

a C:H; Deposition rate; Reaction parameter; RF plasma; SiOx

Indexed keywords

DEPOSITION; ION BOMBARDMENT; THIN FILMS;

PLASMA COATINGS;

POLYMERS;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0043194089     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00444-4     Document Type: Article

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