Recent advances in the atmospheric pressure PE-CVD of fluorocarbon films: Influence of air and water vapour impurities

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

  Fanelli, Fiorenza ^a   Renzo, Giovanni Di ^a   Fracassi, Francesco ^a   D'Agostino, Riccardo ^a  

^a UNIVERSITY OF BARI   (Italy)

Author keywords

Atmospheric pressure; Dielectric barrier discharge (dbd); Fluorocarbon films; Plasma enhanced chemical vapour deposition (pe cvd)

Indexed keywords

ATMOSPHERIC PRESSURE DIELECTRIC BARRIER DISCHARGES; CHEMICAL VAPOUR DEPOSITION; DEPOSITION PROCESS; DIELECTRIC BARRIER DISCHARGE (DBD); EXPERIMENTAL CONDITIONS; F/C RATIO; FEED GAS; FILAMENTARY DIELECTRIC BARRIER DISCHARGES; FLUORO-POLYMERS; FLUOROCARBON FILMS; GAS EFFLUENTS; GASPHASE; GC-MS ANALYSIS; WATER VAPOUR; XPS;

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; ATMOSPHERICS; CHEMICAL CONTAMINATION; DEPOSITION; DIAMOND FILMS; DIELECTRIC DEVICES; EFFLUENTS; FLOW CONTROL; IMPURITIES; PHOTORESISTS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS;

GAS PERMEABLE MEMBRANES;

EID: 77954900567     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200931107     Document Type: Conference Paper

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