Remote microwave PECVD for continuous, wide-area coating under atmospheric pressure

Chemical Vapor Deposition

Volumn 11, Issue 11-12, 2005, Pages 497-509

  Hopfe, Volkmar ^a   Spitzl, Ralf ^b   Dani, Ines ^a   Maeder, Gerrit ^a   Roch, Liliana ^a   Rogler, Daniela ^a   Leupolt, Beate ^a   Schoeneich, Bolko ^a  

^a FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

^b Iplas Innovative Plasma Systems GmbH   (Germany)

Author keywords

Atmospheric pressure; FTIR; Microwave plasma; PECVD; Silica

Indexed keywords

ATMOSPHERIC PRESSURE; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLASS; MICROWAVES; OPTIMIZATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; STAINED GLASS;

MASS PRODUCED MATERIALS; MICROWAVE PLASMA ACTIVATION; REACTOR DESIGN;

COATINGS;

EID: 29844443434     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200406352     Document Type: Article

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