Plasma-polymerization of HMDSO using an atmospheric pressure dielectric barrier discharge

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

  Morent, Rino ^a   De Geyter, Nathalie ^a   Jacobs, Tinneke ^a   Van Vlierberghe, Sandra ^a,b   Dubruel, Peter ^a   Leys, Christophe ^a   Schacht, Etienne ^a  

^a GHENT UNIVERSITY   (Belgium)

^b RESEARCH FOUNDATION FLANDERS FWO   (Belgium)

Author keywords

Atomic force microscopy (AFM); Dielectric barrier discharges (DBD); FT IR; Hexamethyldisiloxane (HMDSO); Plasma polymerization

Indexed keywords

ATMOSPHERIC PRESSURE DIELECTRIC BARRIER DISCHARGES; CHEMICAL COMPOSITIONS; DEPOSITED FILMS; DIELECTRIC BARRIER DISCHARGES; DISCHARGE POWER; FEED COMPOSITIONS; FILM PROPERTIES; FT-IR; HEXAMETHYL DISILOXANE; HEXAMETHYLDISILOXANE (HMDSO); MONOMER CONCENTRATION; POLYDIMETHYLSILOXANE PDMS;

ANGLE MEASUREMENT; ARGON; ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; ATOMS; CONTACT ANGLE; ELECTRIC DISCHARGES; FLOW CONTROL; INFRARED SPECTROSCOPY; MONOMERS; PLASMA DEPOSITION; PLASMA POLYMERIZATION; PLASMAS; POLYMERS; SILICONES; WAVELET TRANSFORMS;

DIELECTRIC DEVICES;

EID: 77954897969     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200931101     Document Type: Conference Paper

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