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Volumn 49, Issue 9, 2009, Pages 662-670

Atmospheric-pressure plasmas for solar cell manufacturing

Author keywords

Atmospheric pressure

Indexed keywords

ATMOSPHERIC CHEMISTRY; ELECTRIC DISCHARGES; PLASMA DIAGNOSTICS; SILICON SOLAR CELLS; THROUGHPUT;

EID: 76849099489     PISSN: 08631042     EISSN: 15213986     Source Type: Journal    
DOI: 10.1002/ctpp.200910071     Document Type: Article
Times cited : (8)

References (17)
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    • Hartmann, R.1    Kraut, G.2    Landes, K.3
  • 8
    • 67650308830 scopus 로고    scopus 로고
    • Non-transferred arc plasmatron
    • European Patent 97810823
    • R. Hartmann, J. Zierhut, K. Landes, European Patent 97810823, "Non-transferred arc plasmatron", (1997).
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    • Hartmann, R.1    Zierhut, J.2    Landes, K.3
  • 10
    • 0032657514 scopus 로고    scopus 로고
    • Process and equipment simulation of dry silicon etching in the absence of ion bombardment
    • T. Otto, H. Wolf, R. Streiter, A. Dehoff, K. Wandel, T. Gessner, "Process and equipment simulation of dry silicon etching in the absence of ion bombardment", Microelectron. Eng. 45 377-391 (1999).
    • (1999) Microelectron. Eng. , vol.45 , pp. 377-391
    • Otto, T.1    Wolf, H.2    Streiter, R.3    Dehoff, A.4    Wandel, K.5    Gessner, T.6
  • 11
    • 0032353593 scopus 로고    scopus 로고
    • Remote Plasma Etching of Silicon nitride and Silicon Dioxide Using NF3/O2 Gas Mixtures
    • B.E.E. Kastenmeier, P.J. Matsuo, G.S. Oehrlein, and J.G. Langan, "Remote Plasma Etching of Silicon nitride and Silicon Dioxide Using NF3/O2 Gas Mixtures", J. Vac. Sci. Technol. A 16 4, 2047-2056 (1998).
    • (1998) J. Vac. Sci. Technol. A , vol.16 , Issue.4 , pp. 2047-2056
    • Kastenmeier, B.E.E.1    Matsuo, P.J.2    Oehrlein, G.S.3    Langan, J.G.4
  • 16
    • 0003477452 scopus 로고
    • Handbook of chemical vapor deposition (CVD): principles, technology, and applications
    • Noyes Publications
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    • (1992)
    • Pierson, H.O.1
  • 17
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    • Plasma-Assisted Chemical Vapor Deposition of Silicon Nitride from Silane-Ammonia and Silane-Nitrogen Mixtures: a Comparison
    • Thesis (PH.D.) STEVENS INSTITUTE OF TECHNOLOGY, Vol. 50-09, source: Dissertation Abstracts International, Section: B, page: 4172
    • W.E. Quinn, "Plasma-Assisted Chemical Vapor Deposition of Silicon Nitride from Silane-Ammonia and Silane-Nitrogen Mixtures: a Comparison", Thesis (PH.D.) STEVENS INSTITUTE OF TECHNOLOGY, source: Dissertation Abstracts International, Volume: 50-09, Section: B, page: 4172 (1988).
    • (1988)
    • Quinn, W.E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.