-
1
-
-
0037634385
-
Degradation of tunnel oxide by FN current stress and its effects on data retention characteristics of 90 nm NAND Flash memory cells
-
J.-D. Lee, J.-H. Choi, D. Park, and K. Kim, "Degradation of tunnel oxide by FN current stress and its effects on data retention characteristics of 90 nm NAND Flash memory cells," in Proc. IRPS, 2003, pp. 497-501.
-
(2003)
Proc. IRPS
, pp. 497-501
-
-
Lee, J.-D.1
Choi, J.-H.2
Park, D.3
Kim, K.4
-
2
-
-
0347270401
-
Data retention characteristics of sub-100 nm NAND Flash memory cells
-
Dec.
-
J.-D. Lee, J.-H. Choi, D. Park, and K. Kim, "Data retention characteristics of sub-100 nm NAND Flash memory cells," IEEE Electron Device Lett., vol. 24, no. 12, pp. 748-750, Dec. 2003.
-
(2003)
IEEE Electron Device Lett.
, vol.24
, Issue.12
, pp. 748-750
-
-
Lee, J.-D.1
Choi, J.-H.2
Park, D.3
Kim, K.4
-
3
-
-
2342522065
-
Effects of interface trap generation and annihilation on the data retention characteristics of Flash memory cells
-
Mar.
-
J.-D. Lee, J.-H. Choi, D. Park, and K. Kim, "Effects of interface trap generation and annihilation on the data retention characteristics of Flash memory cells," IEEE Trans. Device Mater. Rel., vol. 4, no. 1, pp. 110-117, Mar. 2004.
-
(2004)
IEEE Trans. Device Mater. Rel.
, vol.4
, Issue.1
, pp. 110-117
-
-
Lee, J.-D.1
Choi, J.-H.2
Park, D.3
Kim, K.4
-
4
-
-
34547819223
-
The effect of trapped charge distributions on data retention characteristics of NAND Flash memory cells
-
DOI 10.1109/LED.2007.901271
-
M. Park, K. Suh, K. Kim, S.-H. Hur, K. Kim, and W.-S. Lee, "The effect of trapped charge distributions on data retention characteristics of NAND Flash memory cells," IEEE Electron Device Lett., vol. 28, no. 8, pp. 750-752, Aug. 2007. (Pubitemid 47242040)
-
(2007)
IEEE Electron Device Letters
, vol.28
, Issue.8
, pp. 750-752
-
-
Park, M.1
Suh, K.2
Kim, K.3
Hur, S.-H.4
Kim, K.5
Lee, W.-S.6
-
5
-
-
0027816862
-
Degradation mechanism of flash EEPROMprogramming after program/erase cycles
-
S. Yamada, Y. Hiura, T. Yamane, K. Amemiya, Y. Ohshima, and K. Yoshikawa, "Degradation mechanism of Flash EEPROMprogramming after program/erase cycles," in IEDM Tech. Dig., 1993, pp. 23-26.
-
(1993)
IEDM Tech. Dig.
, pp. 23-26
-
-
Yamada, S.1
Hiura, Y.2
Yamane, T.3
Amemiya, K.4
Ohshima, Y.5
Yoshikawa, K.6
-
6
-
-
0032097823
-
Degradation of thin tunnel gate oxide under constant fowler-nordheim current stress for a flash EEPROM
-
PII S0018938398036806
-
Y.-B. Park and D. K. Schroder, "Degradation of thin tunnel gate oxide under constant Fowler-Nordheim current stress for a Flash EEPROM," IEEE Trans. Electron Devices, vol. 45, no. 6, pp. 1361-1368, Jun. 1998. (Pubitemid 128736638)
-
(1998)
IEEE Transactions on Electron Devices
, vol.45
, Issue.6
, pp. 1361-1368
-
-
Park, Y.-B.1
Schroder, D.K.2
-
7
-
-
77952330181
-
The new program/erase cycling degradation mechanism of NAND Flash memory devices
-
A. Fayrushin, K. Seol, J. Na, S. Hur, J. Choi, and K. Kim, "The new program/erase cycling degradation mechanism of NAND Flash memory devices," in IEDM Tech. Dig., 2009, pp. 823-826.
-
(2009)
IEDM Tech. Dig.
, pp. 823-826
-
-
Fayrushin, A.1
Seol, K.2
Na, J.3
Hur, S.4
Choi, J.5
Kim, K.6
-
8
-
-
0028755689
-
Read-disturb degradation mechanism due to electron trapping in the tunnel oxide for low-voltage flash memories
-
M. Kato, N. Miyamoto, H. Kume, A. Satoh, T. Adachi, M. Ushiyama, and K. Kimura, "Read-disturb degradation mechanism due to electron trapping in the tunnel oxide for low-voltage flash memories," in IEDM Tech. Dig., 1994, pp. 45-48.
-
(1994)
IEDM Tech. Dig.
, pp. 45-48
-
-
Kato, M.1
Miyamoto, N.2
Kume, H.3
Satoh, A.4
Adachi, T.5
Ushiyama, M.6
Kimura, K.7
-
9
-
-
0033742029
-
Analysis of detrap current due to oxide traps to improve flash memory retention
-
R. Yamada, Y. Mori, Y. Okuyama, J. Yugami, T. Nishimoto, and H. Kume, "Analysis of detrap current due to oxide traps to improve flash memory retention," in Proc. IRPS, 2000, pp. 200-204.
-
(2000)
Proc. IRPS
, pp. 200-204
-
-
Yamada, R.1
Mori, Y.2
Okuyama, Y.3
Yugami, J.4
Nishimoto, T.5
Kume, H.6
-
10
-
-
0034784950
-
A novel analysis method of threshold voltage shift due to detrap in a multi-level flash memory
-
R. Yamada, T. Sekiguchi, Y. Okuyama, J. Yugami, and H. Kume, "A novel analysis method of threshold voltage shift due to detrap in a multi-level Flash memory," in VLSI Symp. Tech. Dig., 2001, pp. 115-116. (Pubitemid 32950685)
-
(2001)
IEEE Symposium on VLSI Circuits, Digest of Technical Papers
, pp. 115-116
-
-
Yamada, R.-I.1
Sekiguchi, T.2
Okuyama, Y.3
Yugami, J.4
Kume, H.5
-
11
-
-
11144248077
-
Flash EEPROM threshold instabilities due to charge trapping during program/erase cycling
-
Sep.
-
N. Mielke, H. Belgal, I. Kalastirsky, P. Kalavade, A. Kurtz, Q. Meng, N. Righos, and J. Wu, "Flash EEPROM threshold instabilities due to charge trapping during program/erase cycling," IEEE Trans. Device Mater. Rel., vol. 4, no. 3, pp. 335-344, Sep. 2004.
-
(2004)
IEEE Trans. Device Mater. Rel.
, vol.4
, Issue.3
, pp. 335-344
-
-
Mielke, N.1
Belgal, H.2
Kalastirsky, I.3
Kalavade, P.4
Kurtz, A.5
Meng, Q.6
Righos, N.7
Wu, J.8
-
12
-
-
34250790753
-
Recovery effects in the distributed cycling of flash memories
-
DOI 10.1109/RELPHY.2006.251188, 4017129, 2006 IEEE International Reliability Physics Symposium Proceedings, 44th Annual
-
N. Mielke, H. Belgal, A. Fazio, Q. Meng, and N. Righos, "Recovery effects in the distributed cycling of Flash memories," in Proc. IRPS, 2006, pp. 29-35. (Pubitemid 46964487)
-
(2006)
IEEE International Reliability Physics Symposium Proceedings
, pp. 29-35
-
-
Mielke, N.1
Belgal, H.P.2
Fazio, A.3
Meng, Q.4
Righos, N.5
-
13
-
-
0037560876
-
RTS amplitudes in decananometer MOSFETs: 3-D simulation study
-
Mar.
-
A. Asenov, R. Balasubramaniam, A. R. Brown, and J. H. Davies, "RTS amplitudes in decananometer MOSFETs: 3-D simulation study," IEEE Trans. Electron Devices, vol. 50, no. 3, pp. 839-845, Mar. 2003.
-
(2003)
IEEE Trans. Electron Devices
, vol.50
, Issue.3
, pp. 839-845
-
-
Asenov, A.1
Balasubramaniam, R.2
Brown, A.R.3
Davies, J.H.4
-
14
-
-
37749015265
-
Statistical model for random telegraph noise in Flash memories
-
Jan.
-
C. Monzio Compagnoni, R. Gusmeroli, A. S. Spinelli, A. L. Lacaita, M. Bonanomi, and A. Visconti, "Statistical model for random telegraph noise in Flash memories," IEEE Trans. Electron Devices, vol. 55, no. 1, pp. 388-395, Jan. 2008.
-
(2008)
IEEE Trans. Electron Devices
, vol.55
, Issue.1
, pp. 388-395
-
-
Monzio Compagnoni, C.1
Gusmeroli, R.2
Spinelli, A.S.3
Lacaita, A.L.4
Bonanomi, M.5
Visconti, A.6
-
15
-
-
68349125520
-
Comprehensive analysis of random telegraph noise instability and its scaling in deca-nanometer Flash memories
-
Aug.
-
A. Ghetti, C. Monzio Compagnoni, A. S. Spinelli, and A. Visconti, "Comprehensive analysis of random telegraph noise instability and its scaling in deca-nanometer Flash memories," IEEE Trans. Electron Devices, vol. 56, no. 8, pp. 1746-1752, Aug. 2009.
-
(2009)
IEEE Trans. Electron Devices
, vol.56
, Issue.8
, pp. 1746-1752
-
-
Ghetti, A.1
Monzio Compagnoni, C.2
Spinelli, A.S.3
Visconti, A.4
-
16
-
-
77955171612
-
Fundamental limitations to the width of the programmed VT distribution of NOR Flash memories
-
Aug.
-
C. Monzio Compagnoni, L. Chiavarone, M. Calabrese, M. Ghidotti, A. L. Lacaita, A. S. Spinelli, and A. Visconti, "Fundamental limitations to the width of the programmed VT distribution of NOR Flash memories," IEEE Trans. Electron Devices, vol. 57, no. 8, pp. 1761-1767, Aug. 2010.
-
(2010)
IEEE Trans. Electron Devices
, vol.57
, Issue.8
, pp. 1761-1767
-
-
Monzio Compagnoni, C.1
Chiavarone, L.2
Calabrese, M.3
Ghidotti, M.4
Lacaita, A.L.5
Spinelli, A.S.6
Visconti, A.7
-
17
-
-
77956063356
-
Comprehensive investigation of statistical effects in nitride memories-Part II: Scaling analysis and impact on device performance
-
Sep.
-
C. Monzio Compagnoni, A. Mauri, S. M. Amoroso, A. Maconi, E. Greco, A. S. Spinelli, and A. L. Lacaita, "Comprehensive investigation of statistical effects in nitride memories-Part II: Scaling analysis and impact on device performance," IEEE Trans. Electron Devices, vol. 57, no. 9, pp. 2124-2131, Sep. 2010.
-
(2010)
IEEE Trans. Electron Devices
, vol.57
, Issue.9
, pp. 2124-2131
-
-
Monzio Compagnoni, C.1
Mauri, A.2
Amoroso, S.M.3
Maconi, A.4
Greco, E.5
Spinelli, A.S.6
Lacaita, A.L.7
-
19
-
-
77957923243
-
Investigation of the threshold voltage instability after distributed cycling in nanoscale NAND Flash memory arrays
-
C. Monzio Compagnoni, C. Miccoli, R. Mottadelli, S. Beltrami, M. Ghidotti, A. L. Lacaita, A. S. Spinelli, and A. Visconti, "Investigation of the threshold voltage instability after distributed cycling in nanoscale NAND Flash memory arrays," in Proc. IRPS, 2010, pp. 604-610.
-
(2010)
Proc. IRPS
, pp. 604-610
-
-
Monzio Compagnoni, C.1
Miccoli, C.2
Mottadelli, R.3
Beltrami, S.4
Ghidotti, M.5
Lacaita, A.L.6
Spinelli, A.S.7
Visconti, A.8
-
20
-
-
0029480949
-
Fast and accurate programming method for multi-level NAND EEPROMs
-
G. J. Hemink, T. Tanaka, T. Endoh, S. Aritome, and R. Shirota, "Fast and accurate programming method for multi-level NAND EEPROMs," in VLSI Symp. Tech. Dig., 1995, pp. 129-130.
-
(1995)
VLSI Symp. Tech. Dig.
, pp. 129-130
-
-
Hemink, G.J.1
Tanaka, T.2
Endoh, T.3
Aritome, S.4
Shirota, R.5
-
21
-
-
53649106367
-
Ultimate accuracy for the NAND Flash program algorithm due to the electron injection statistics
-
Oct.
-
C. Monzio Compagnoni, A. S. Spinelli, R. Gusmeroli, S. Beltrami, A. Ghetti, and A. Visconti, "Ultimate accuracy for the NAND Flash program algorithm due to the electron injection statistics," IEEE Trans. Electron Devices, vol. 55, no. 10, pp. 2695-2702, Oct. 2008.
-
(2008)
IEEE Trans. Electron Devices
, vol.55
, Issue.10
, pp. 2695-2702
-
-
Monzio Compagnoni, C.1
Spinelli, A.S.2
Gusmeroli, R.3
Beltrami, S.4
Ghetti, A.5
Visconti, A.6
-
22
-
-
69949152635
-
Random telegraph noise effect on the programmed threshold-voltage distribution of Flash memories
-
Sep.
-
C. Monzio Compagnoni, M. Ghidotti, A. L. Lacaita, A. S. Spinelli, and A. Visconti, "Random telegraph noise effect on the programmed threshold-voltage distribution of Flash memories," IEEE Electron Device Lett., vol. 30, no. 9, pp. 984-986, Sep. 2009.
-
(2009)
IEEE Electron Device Lett.
, vol.30
, Issue.9
, pp. 984-986
-
-
Monzio Compagnoni, C.1
Ghidotti, M.2
Lacaita, A.L.3
Spinelli, A.S.4
Visconti, A.5
-
23
-
-
73349136258
-
Data retention and program/erase sensitivity to the array background pattern in deca-nanometer NAND Flash memories
-
Jan.
-
C. Monzio Compagnoni, A. Ghetti, M. Ghidotti, A. S. Spinelli, and A. Visconti, "Data retention and program/erase sensitivity to the array background pattern in deca-nanometer NAND Flash memories," IEEE Trans. Electron Devices, vol. 57, no. 1, pp. 321-327, Jan. 2010.
-
(2010)
IEEE Trans. Electron Devices
, vol.57
, Issue.1
, pp. 321-327
-
-
Monzio Compagnoni, C.1
Ghetti, A.2
Ghidotti, M.3
Spinelli, A.S.4
Visconti, A.5
-
24
-
-
59649119519
-
The effect of negative VTH of NAND Flash memory cells on data retention characteristics
-
Feb.
-
M. Park, E. Ahn, E. Cho, K. Kim, and W.-S. Lee, "The effect of negative VTH of NAND Flash memory cells on data retention characteristics," IEEE Electron Device Lett., vol. 30, no. 2, pp. 155-157, Feb. 2009.
-
(2009)
IEEE Electron Device Lett.
, vol.30
, Issue.2
, pp. 155-157
-
-
Park, M.1
Ahn, E.2
Cho, E.3
Kim, K.4
Lee, W.-S.5
|