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Volumn 519, Issue 19, 2011, Pages 6339-6343

Evolution of optical properties with deposition time of silicon nitride and diamond-like carbon films deposited by radio-frequency plasma-enhanced chemical vapor deposition method

(3) Smietana, Mateusz a,b Bock, Wojtek J a Szmidt, Jan b

a UNIVERSITÉ DU QUÉBEC EN OUTAOUAIS (Canada)

b WARSAW UNIVERSITY OF TECHNOLOGY (Poland)

Author keywords

Diamond like carbon; Ellipsometry; Optical devices; Optical properties; Plasma enhanced chemical vapor deposition; Silicon nitride; Thin films

Indexed keywords

DEPOSITION PROCESS; DEPOSITION TECHNIQUE; DEPOSITION TEMPERATURES; DEPOSITION TIME; DIAMOND-LIKE CARBON; DLC FILM; FUNCTIONAL PROPERTIES; INFRARED SPECTRAL; NANO-METER SCALE; RADIO FREQUENCIES; THERMAL BUDGET;

CARBON FILMS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; DIAMOND LIKE CARBON FILMS; DIAMONDS; LIGHT REFRACTION; OPTICAL DEVICES; OPTICAL INSTRUMENTS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; REFRACTOMETERS; SEMICONDUCTING SILICON COMPOUNDS; SILICON NITRIDE;

OPTICAL FILMS;

EID: 79958220467 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.04.032 Document Type: Article

Times cited : (45)

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