Mechanical properties of PECVD thin ceramic films

Journal of the European Ceramic Society

Volumn 30, Issue 3, 2010, Pages 689-697

  Subhash, Ghatu ^a   Hittepole, Philip ^b   Maiti, Spandan ^b  

^a UNIVERSITY OF FLORIDA   (United States)

^b Michigan Technological University   (United States)

Author keywords

Ceramic films; CSM; Modulus and hardness; Nanoindentation; PECVD

Indexed keywords

CERAMIC FILMS; CONTINUOUS STIFFNESS MEASUREMENT; CSM; DEPTH MEASUREMENTS; MODULUS AND HARDNESS; NANOINDENTERS; NITRIDE FILMS; PECVD; PHENOMENOLOGICAL MODELS; SILICON DIOXIDE; SILICON SUBSTRATES; SUBSTRATE EFFECTS; SUBSTRATE PROPERTIES; THIN CERAMIC FILMS;

CERAMIC MATERIALS; HARDNESS; MECHANICAL PROPERTIES; NANOINDENTATION; OXIDE FILMS; PLASMA DEPOSITION; SILICA; SILICON NITRIDE; SUBSTRATES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 70449533066     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jeurceramsoc.2009.09.020     Document Type: Article

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