Optimization of SiN thin film for high index contrast planar silica waveguides

Materials Science and Engineering: B

Volumn 118, Issue 1-3, 2005, Pages 242-245

  Kim, Y T ^a   Kim, D S ^a   Yoon, D H ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Annealing; Plasma enhanced chemical vapor deposition; Silicon nitride

Indexed keywords

ANNEALING; INDEXING (MATERIALS WORKING); OPTIMIZATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; SILICON NITRIDE;

HIGH INDEX CONTRAST; PARALLEL PLATE SYSTEMS; PLANAR SILICA WAVEGUIDES; RADIATIVE LOSSES;

THIN FILMS;

EID: 15444371464     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2004.12.090     Document Type: Conference Paper

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