Properties of plasma enhanced chemical vapor deposited silicon nitride for the application in multicrystalline silicon solar cells

Thin Solid Films

Volumn 515, Issue 12, 2007, Pages 5000-5003

  Yoo, Jinsu ^a   Dhungel, S K ^a   Yi, J ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Multicrystalline silicon; PECVD; Silicon nitride films; Solar cells

Indexed keywords

HYDROGENATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILICON NITRIDE; SILICON SOLAR CELLS; SILICON WAFERS;

DEPOSITION RATE; GAS RATIO; MULTICRYSTALLINE SILICON; SILICON NITRIDE FILMS;

THIN FILMS;

EID: 33947157118     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.10.040     Document Type: Article

References (15)

1. Sinha A.K., Levinstein H.J., Smith T.E., Quintana G., and Haszko S.E. J. Electrochem. Soc. 125 (1978) 601
2. Sinha A.K., Levinstein H.J., and Smith T.E. J. Appl. Phys. 49 (1978) 2423
3. Stein J., Wells V.A., and Hampy R.E. J. Electrochem. Soc. 126 (1979) 1750
4. Aberle A.G., and Hezel R. Prog. Photovolt. 5 (1997) 29
5. Leguijt C., Lolgen P., Eikelboom J.A., Weeber A.W., Schuurmans F.M., Sinke W.C., Alkemade P.F.A., Sarro P.M., Maree C.H.M., and Verhoef L.A. Sol. Energy Mater. Sol. Cells 40 (1996) 297
6. Sexton F.W. Sol. Energy Mater. 7 (1982) 1
7. Ruby D.S., Wilbanks W.L., and Fleddermann C.B. Proceedings of the World Conference on Photovoltaic Energy Conversion, Hawaii (1994), IEEE, New York 1335
8. Claassen W.A.P., Valkenburg W.G.J.N., Willemsen M.F.C., and Wijgert W.M.V.D. J. Electrochem. Soc. 132 (1985) 893
9. Chen Z., Rohatgi A., Bell R.O., and Kalejs J.P. Appl. Phys. Lett. 65 (1994) 2078
10. Nagel H., Schmidt J., Aberle A.G., and Hezel R. Proceedings of the 14th European Photovoltaic Solar Energy Conference, Nice (1995), Stephens, Bedford 1287
11. De Wolf S., Agostinelli G., and Beaucarne G. J. Appl. Phys. 97 (2005) 063303
12. Cai L., Rohatgi A., Yang D., and El-Sayed M.A. J. Appl. Phys. 80 (1996) 5384
13. Tsu D.V., Lukovsky G., and Mantini M.J. Phys. Rev., B 33 (1986) 7069
14. Mar K.M., and Samuelson G.M. Solid State Technol. 23 4 (1980) 137
15. Lanford W.A., and Rand M.J. J. Appl. Phys. 49 (1978) 2473