Correlation between thickness and optical properties of thin diamond-like carbon films deposited with RF PACVD method

Materials Science and Engineering: B

Volumn 165, Issue 1-2, 2009, Pages 132-134

  Smietana, M ^a   Korwin Pawlowski, M L ^b   Grabarczyk, J ^c   Szmidt, J ^a  

^a WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

^b UNIVERSITÉ DU QUÉBEC EN OUTAOUAIS   (Canada)

^c LODZ UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Chemical vapour deposition; Diamond like carbon; Optical properties; Plasma processing; Thin film deposition; Thin films

Indexed keywords

CARBON FILMS; CHEMICAL VAPOR DEPOSITION; DIAMOND LIKE CARBON FILMS; DIAMONDS; OPTICAL CORRELATION; REFRACTIVE INDEX;

CHEMICAL VAPOR DEPOSITION METHODS; CHEMICAL VAPOUR DEPOSITION; DEPOSITION TIME; DIAMOND LIKE CARBON; DIAMOND-LIKE CARBON FILM; OPTICAL THICKNESS; PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION; RADIO FREQUENCY PLASMA; THIN-FILM DEPOSITIONS; THIN-FILMS;

THIN FILMS;

EID: 72049094074     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2008.12.037     Document Type: Article

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