SCOPUS 정보 검색 플랫폼

Journal of Applied Physics

Volumn 109, Issue 8, 2011, Pages

Correlation of interface roughness for ion beam sputter deposited W/Si multilayers

(2) Biswas, A a Bhattacharyya, D a

a BHABHA ATOMIC RESEARCH CENTRE (India)

Author keywords

[No Author keywords available]

Indexed keywords

C-SI SUBSTRATES; CORRELATION LENGTHS; DIFFUSIVITIES; GRAZING INCIDENCE X-RAY REFLECTIVITIES; IN-PLANE; INTERFACE ROUGHNESS; ION BEAM SPUTTER DEPOSITED; ION-BEAM SPUTTERING; MULTILAYER STACKS; MULTILAYER STRUCTURES; NUMBER OF LAYERS; SPECULAR REFLECTIVITY; VERTICAL CORRELATION; X RAY REFLECTIVITY;

ION BEAMS; REFLECTION; SILICON;

MULTILAYERS;

EID: 79955716401 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3573662 Document Type: Article

Times cited : (18)

References (38)

1
- 36449008772
- 10.1063/1.107429
- N. Yamaguchi, N. Katoh, J. Cho, T. Miyoshi, S. Aoki, and K. Nakajima, Appl. Phys. Lett. 60, 821 (1992). 10.1063/1.107429
- (1992) Appl. Phys. Lett. , vol.60 , pp. 821
- Yamaguchi, N.¹ Katoh, N.² Cho, J.³ Miyoshi, T.⁴ Aoki, S.⁵ Nakajima, K.⁶

2
- 85076058205
- 10.1117/12.51230
- F. E. Christensen, Proc SPIE, 1546, 160 (1991). 10.1117/12.51230
- (1991) Proc SPIE , vol.1546 , pp. 160
- Christensen, F.E.¹

3
- 11144322219
- Lensless imaging of magnetic nanostructures by X-ray spectro-holography
- DOI 10.1038/nature03139
- S. Eisebitt, J. Luning, W.F. Schlotter, M. Lorgen, O. Hellwig, W. Eberhardt, and J. Stohr, Nature 432, 885 (2004). 10.1038/nature03139 (Pubitemid 40037146)
- (2004) Nature , vol.432 , Issue.7019 , pp. 885-888
- Eisebitt, S.¹ Luning, J.² Schlotter, W.F.³ Lorgen, M.⁴ Hellwig, O.⁵ Eberhardt, W.⁶ Stohr, J.⁷

4
- 0032364275
- 10.1107/S0909049597019389
- T. Haga, M.C.K. Tinone, M. Shimada, T. Ohkubo, and A. Ozawa, J. Sync. Rad. 5, 690 (1998). 10.1107/S0909049597019389
- (1998) J. Sync. Rad. , vol.5 , pp. 690
- Haga, T.¹ Tinone, M.C.K.² Shimada, M.³ Ohkubo, T.⁴ Ozawa, A.⁵

5
- 60849125734
- 10.1143/JJAP.48.026506
- D. S. Kim, J. J. Park, K. H. Lee, J. Park, and C. H Nam, Jpn. J. Appl. Phys. 48, 026506 (2009). 10.1143/JJAP.48.026506
- (2009) Jpn. J. Appl. Phys. , vol.48 , pp. 026506
- Kim, D.S.¹ Park, J.J.² Lee, K.H.³ Park, J.⁴ Nam, C.H.⁵

6
- 0026258471
- 10.1143/JJAP.30.3048
- H. Kinoshita, K. Kurihara, and H. Takenaka, Jpn. J. Appl. Phys. 30, 3048 (1991). 10.1143/JJAP.30.3048
- (1991) Jpn. J. Appl. Phys. , vol.30 , pp. 3048
- Kinoshita, H.¹ Kurihara, K.² Takenaka, H.³

7
- 0038209244
- 10.1016/S0169-4332(03)00360-X
- D. Bhattacharyya, A. K. Poswal, M. Senthilkumar, P. V. Satyam, A. K. Balamurugan, A. K. Tyagi, and N. C. Das, Appl. Surf. Sci. 214, 259 (2003). 10.1016/S0169-4332(03)00360-X
- (2003) Appl. Surf. Sci. , vol.214 , pp. 259
- Bhattacharyya, D.¹ Poswal, A.K.² Senthilkumar, M.³ Satyam, P.V.⁴ Balamurugan, A.K.⁵ Tyagi, A.K.⁶ Das, N.C.⁷

8
- 39749201098
- 10.1016/j.apsusc.2007.11.025
- A. Biswas, A. K. Poswal, R. B. Tokas, and D. Bhattacharyya, Appl. Surf. Sci. 254, 3347 (2008). 10.1016/j.apsusc.2007.11.025
- (2008) Appl. Surf. Sci. , vol.254 , pp. 3347
- Biswas, A.¹ Poswal, A.K.² Tokas, R.B.³ Bhattacharyya, D.⁴

9
- 77951022700
- 10.1016/j.nimb.2010.02.010
- A. Biswas and D. Bhattacharyya, Nucl. Instrum. Meth. Phys. Res. B B268, 1594 (2010). 10.1016/j.nimb.2010.02.010
- (2010) Nucl. Instrum. Meth. Phys. Res. B B268 , pp. 1594
- Biswas, A.¹ Bhattacharyya, D.²

10
- 3142698421
- 10.1016/j.nimb.2004.03.006
- M. J. H. Kessels, J. Verhoeven, A. E. Yakshin, F. D. Tichelaar, and F. Bijkerk, Nuc. Ins. Meth. Phys. Res. B 222, 484 (2004). 10.1016/j.nimb.2004.03. 006
- (2004) Nuc. Ins. Meth. Phys. Res. B , vol.222 , pp. 484
- Kessels, M.J.H.¹ Verhoeven, J.² Yakshin, A.E.³ Tichelaar, F.D.⁴ Bijkerk, F.⁵

11
- 18844386466
- Determination of in-depth density profiles of multilayer structures
- DOI 10.1063/1.1882773, 093513
- M. J. H. Kessels, F. Bijerk, F. D. Tichelaar, and J. Verhoeven, J. Appl. Phys. 97, 093513 (2005). 10.1063/1.1882773 (Pubitemid 40690698)
- (2005) Journal of Applied Physics , vol.97 , Issue.9 , pp. 1-8
- Kessels, M.J.H.¹ Bijkerk, F.² Tichelaar, F.D.³ Verhoeven, J.⁴

12
- 17944371350
- Ion-induced interface layer formation in W/Si and WRe/Si multilayers
- DOI 10.1016/j.susc.2005.03.019, PII S0039602805002827
- M. J. H. Kessels, J. Verhoeven, F. D. Tichelaar, and F. Bijerk, Surf. Sci. 582, 227 (2005). 10.1016/j.susc.2005.03.019 (Pubitemid 40597218)
- (2005) Surface Science , vol.582 , Issue.1-3 , pp. 227-234
- Kessels, M.J.H.¹ Verhoeven, J.² Tichelaar, F.D.³ Bijkerk, F.⁴

13
- 33847767109
- Interface roughness evolution in sputtered W Si2 Si multilayers
- DOI 10.1063/1.2422713
- Y. Wang, H. Zhou, L. Zhou, R. L. Headrick, A. T. Macrander, and A. S. Ozcan, J. Appl. Phys. 101, 023503 (2007). 10.1063/1.2422713 (Pubitemid 46372764)
- (2007) Journal of Applied Physics , vol.101 , Issue.2 , pp. 023503
- Wang, Y.-P.¹ Zhou, H.² Zhou, L.³ Headrick, R.L.⁴ MacRander, A.T.⁵ Ozcan, A.S.⁶

14
- 0001330737
- 10.1107/S0021889897001301
- M. Jergel, V. Holy, E. Majkova, S. Luby, and R. Senderak, J. Appl. Cryst. 30, 642 (1997). 10.1107/S0021889897001301
- (1997) J. Appl. Cryst. , vol.30 , pp. 642
- Jergel, M.¹ Holy, V.² Majkova, E.³ Luby, S.⁴ Senderak, R.⁵

15
- 0009907477
- 10.1088/0022-3727/28/4A/047
- M. Jergel, V. Holy, E. Majkova, S. Luby and R. Senderak, J. Phys. D: Appl. Phys. 28, A241 (1995). 10.1088/0022-3727/28/4A/047
- (1995) J. Phys. D: Appl. Phys. , vol.28 , pp. 241
- Jergel, M.¹ Holy, V.² Majkova, E.³ Luby, S.⁴ Senderak, R.⁵

16
- 33744991462
- 10.1103/PhysRevB.38.2297
- S. K. Sinha, E. B. Sirota, S. Garoffi and H. B. Stanley, Phys. Rev. B 38, 2297 (1988). 10.1103/PhysRevB.38.2297
- (1988) Phys. Rev. B , vol.38 , pp. 2297
- Sinha, S.K.¹ Sirota, E.B.² Garoffi, S.³ Stanley, H.B.⁴

17
- 0001030084
- 10.1063/1.350810
- D. G. Stearns, J. Appl. Phys. 71, 4286 (1992). 10.1063/1.350810
- (1992) J. Appl. Phys. , vol.71 , pp. 4286
- Stearns, D.G.¹

18
- 0346659062
- 10.1063/1.354140
- E. Spiller, D. Stearns, and M. Kurmey, J. Appl. Phys. 74, 107 (1993). 10.1063/1.354140
- (1993) J. Appl. Phys. , vol.74 , pp. 107
- Spiller, E.¹ Stearns, D.² Kurmey, M.³

19
- 4243899002
- 10.1103/PhysRevB.49.10668
- V. Holy and T. Baumbach, Phys. Rev. B 49, 10688 (1994). 10.1103/PhysRevB.49.10668
- (1994) Phys. Rev. B , vol.49 , pp. 10688
- Holy, V.¹ Baumbach, T.²

20
- 0001334179
- 10.1103/PhysRevB.53.6048
- D. K. G. de Boer, Phys. Rev. B 53, 6048 (1996). 10.1103/PhysRevB.53.6048
- (1996) Phys. Rev. B , vol.53 , pp. 6048
- Boer, D.K.G.D.¹

21
- 0001368790
- 10.1063/1.373681
- D. L. Windt, F. E. Christensen, W. W. Craig, C. Hailey, F. A. Harrison, M. Jimenez-Garate, R. Kalyanaraman, and P. H. Mao, J. Appl. Phys. 88, 460 (2000). 10.1063/1.373681
- (2000) J. Appl. Phys. , vol.88 , pp. 460
- Windt, D.L.¹ Christensen, F.E.² Craig, W.W.³ Hailey, C.⁴ Harrison, F.A.⁵ Jimenez-Garate, M.⁶ Kalyanaraman, R.⁷ Mao, P.H.⁸

22
- 0032746394
- 10.1039/a906054e
- C.-Y. Lee and W.-C. Yang, J. Mater. Chem. 9, 2445 (1999). 10.1039/a906054e
- (1999) J. Mater. Chem. , vol.9 , pp. 2445
- Lee, C.-Y.¹ Yang, W.-C.²

23
- 36449003209
- 10.1063/1.350735
- M. B. Stearns, C. Chang, and D. G. Stearns, J. Appl. Phys. 71, 187 (1992). 10.1063/1.350735
- (1992) J. Appl. Phys. , vol.71 , pp. 187
- Stearns, M.B.¹ Chang, C.² Stearns, D.G.³

24
- 0000992319
- 10.1063/1.338122
- A. K. Petford-Lomg, M. B. Stearns, C. H. Chang, S. R. Nutt, D. G. Stearns, N. M. Cegilo, and A. M. Hawryluk, J. Appl. Phys. 61, 1422 (1987). 10.1063/1.338122
- (1987) J. Appl. Phys. , vol.61 , pp. 1422
- Petford-Lomg, A.K.¹ Stearns, M.B.² Chang, C.H.³ Nutt, S.R.⁴ Stearns, D.G.⁵ Cegilo, N.M.⁶ Hawryluk, A.M.⁷

25
- 84953675274
- 10.1116/1.577221
- D. G. Stearns, R. S. Rosen and S. P. Vernon, J. Vac. Sci. Technol A 9, 2662 (1991). 10.1116/1.577221
- (1991) J. Vac. Sci. Technol A , vol.9 , pp. 2662
- Stearns, D.G.¹ Rosen, R.S.² Vernon, S.P.³

26
- 0346706432
- J. P Schlomka, M. Tolan, L. Schwalowsky, O. H. Seeck, J. Stettner, and W. Press, Phys. Rev. B, 51, 2311 (1995).
- (1995) Phys. Rev. B , vol.51 , pp. 2311
- Schlomka, J.P.¹ Tolan, M.² Schwalowsky, L.³ Seeck, O.H.⁴ Stettner, J.⁵ Press, W.⁶

27
- 26144449160
- 10.1103/PhysRev.95.359
- I. G. Parrat, Phys. Rev. 95, 359 (1954). 10.1103/PhysRev.95.359
- (1954) Phys. Rev. , vol.95 , pp. 359
- Parrat, I.G.¹

28
- 0001503099
- 10.1051/rphysap:0198800230100168700
- E. Spliier, Rev. Phys. Appl. 23, 1687 (1988). 10.1051/rphysap: 0198800230100168700
- (1988) Rev. Phys. Appl. , vol.23 , pp. 1687
- Spliier, E.¹

29
- 0003732829
- (Cornell University Press, New York).
- R. W. James, The Optical Principles of Diffraction of X-rays, (Cornell University Press, New York, 1965).
- (1965) The Optical Principles of Diffraction of X-rays
- James, R.W.¹

30
- 56249127529
- 10.1063/1.368098
- D. G. Stearns, D. P. Gaines, D. W. Sweeney, and E. M. Gullikson, J. Appl. Phys. 84, 1003 (1998). 10.1063/1.368098
- (1998) J. Appl. Phys. , vol.84 , pp. 1003
- Stearns, D.G.¹ Gaines, D.P.² Sweeney, D.W.³ Gullikson, E.M.⁴

31
- 0001233880
- 10.1063/1.372977
- A. Ulyanenkov, R. Matsuo, K. Omote, K. Inaba, J. Harada, M. Ishino, M. Nishil, and O. Yada, J. Appl. Phys. 87, 7255 (2000). 10.1063/1.372977
- (2000) J. Appl. Phys. , vol.87 , pp. 7255
- Ulyanenkov, A.¹ Matsuo, R.² Omote, K.³ Inaba, K.⁴ Harada, J.⁵ Ishino, M.⁶ Nishil, M.⁷ Yada, O.⁸

32
- 79955730914
- Available at
- D. L. Windt, IMD Version 4.1.1, 2000. Available at http://cletus.phys. columbia.edu/windt/idl.
- (2000) IMD Version 4.1.1
- Windt, D.L.¹

33
- 0036534744
- Co/C and W/Si multilayers deposited by ion-beam sputtering for the soft X-ray range
- DOI 10.1007/s003390000695
- S. M. Feng, G. L. Zhu, J. D. Shao, K. Yi, Z. X. Fan, and X. M. Dou, Appl. Phys. A 74, 553 (2002). 10.1007/s003390000695 (Pubitemid 34268671)
- (2002) Applied Physics A: Materials Science and Processing , vol.74 , Issue.4 , pp. 553-555
- Feng, S.M.¹ Zhu, G.L.² Shao, J.D.³ Yi, K.⁴ Fan, Z.X.⁵ Dou, X.M.⁶

34
- 0037098430
- 10.1103/PhysRevB.65.245416
- A. Paul, and G. S. Lodha, Phys. Rev. B 65, 245416 (2002). 10.1103/PhysRevB.65.245416
- (2002) Phys. Rev. B , vol.65 , pp. 245416
- Paul, A.¹ Lodha, G.S.²

35
- 36449006422
- 10.1063/1.350976
- D. E. Savage, N. Schikke, Y. H. Phang, and M. G. Lagly, J. Appl. Phys. 71, 3283 (1992). 10.1063/1.350976
- (1992) J. Appl. Phys. , vol.71 , pp. 3283
- Savage, D.E.¹ Schikke, N.² Phang, Y.H.³ Lagly, M.G.⁴

36
- 0000159015
- Nonspecular x-ray reflectivity study of roughness scaling in Si/Mo multilayers
- DOI 10.1063/1.1332095
- J. M. Freitag, and B. M. Clemens, J. Appl. Phys. 89, 1101 (2001). 10.1063/1.1332095 (Pubitemid 33661863)
- (2001) Journal of Applied Physics , vol.89 , Issue.2 , pp. 1101-1107
- Freitag, J.M.¹ Clemens, B.M.²

37
- 3142742329
- 10.1063/1.1764598
- Z. L. Liu, and Y. G. Shen, Appl. Phys. Lett. 84, 5121 (2004). 10.1063/1.1764598
- (2004) Appl. Phys. Lett. , vol.84 , pp. 5121
- Liu, Z.L.¹ Shen, Y.G.²

38
- 0030215442
- 10.1063/1.117580
- M. Chaldek, V. Valvoda, C. Dorner, C. Holy, and J. Grim, Appl. Phys. Lett. 69, 1318 (1996). 10.1063/1.117580
- (1996) Appl. Phys. Lett. , vol.69 , pp. 1318
- Chaldek, M.¹ Valvoda, V.² Dorner, C.³ Holy, C.⁴ Grim, J.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.