Study of chemical vapor deposition reaction between tungsten hexafluoride and silicon difluoride

Journal of Materials Chemistry

Volumn 9, Issue 10, 1999, Pages 2445-2448

  Lee, Chi Young ^a   Yang, Wen Chung ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

SILICON DIFLUORIDE; TUNGSTEN DERIVATIVE; TUNGSTEN HEXAFLUORIDE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL ANALYSIS; REACTION ANALYSIS; STRUCTURE ANALYSIS; TEMPERATURE MEASUREMENT; VAPORIZATION; X RAY POWDER DIFFRACTION;

EID: 0032746394     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/a906054e     Document Type: Article

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