Characterization of ion beam sputter deposited W and Si films and W/Si interfaces by grazing incidence X-ray reflectivity, atomic force microscopy and spectroscopic ellipsometry

Applied Surface Science

Volumn 254, Issue 11, 2008, Pages 3347-3356

  Biswas, A ^a   Poswal, A K ^a   Tokas, R B ^a   Bhattacharyya, D ^a  

^a BHABHA ATOMIC RESEARCH CENTRE   (India)

Author keywords

GIXR; IBS; SE

Indexed keywords

ATOMIC FORCE MICROSCOPY; INTERFACES (MATERIALS); SILICON; SPECTROSCOPIC ELLIPSOMETRY; SPUTTER DEPOSITION; TUNGSTEN;

GRAZING INCIDENCE X-RAY REFLECTIVITY; ION BEAM SPUTTERING SYSTEM; X-RAY MULTILAYER MIRRORS;

ION BEAM ASSISTED DEPOSITION;

EID: 39749201098     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.11.025     Document Type: Article

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