Interface roughness evolution in sputtered W Si2 Si multilayers

Journal of Applied Physics

Volumn 101, Issue 2, 2007, Pages

  Wang, Yi Ping ^a   Zhou, Hua ^a   Zhou, Lan ^a   Headrick, Randall L ^a   MacRander, Albert T ^b   Özcan, Ahmet S ^c  

^a University of Vermont ^*  (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

^c USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; MAGNETRON SPUTTERING; MULTILAYERS; SILICON; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; X RAY SCATTERING;

ENERGETIC NEUTRALS; FILM DEPOSITION; ROUGHNESS EVOLUTION; TEMPORAL RESOLUTION;

AMORPHOUS FILMS;

EID: 33847767109     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2422713     Document Type: Article

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