Interface roughness evolution in sputtered W Si2 Si multilayers

Journal of Applied Physics

Volumn 101, Issue 2, 2007, Pages

  Wang, Yi Ping ^a   Zhou, Hua ^a   Zhou, Lan ^a   Headrick, Randall L ^a   MacRander, Albert T ^b   Özcan, Ahmet S ^c  

^a UNIVERSITY OF VERMONT   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

^c Boston University ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; MAGNETRON SPUTTERING; MULTILAYERS; SILICON; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; X RAY SCATTERING;

ENERGETIC NEUTRALS; FILM DEPOSITION; ROUGHNESS EVOLUTION; TEMPORAL RESOLUTION;

AMORPHOUS FILMS;

EID: 33847767109     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2422713     Document Type: Article

References (26)

1. A. Patelli, J. Ravagnan, V. Rigato, G. Salmaso, D. Silvestrini, E. Bontempi, and L. E. Depero, Appl. Surf. Sci. 238, 262 (2004).
2. J. Birch, F. Eriksson, G. A. Johansson, and H. M. Hertz, Vacuum 68, 275 (2003).
3. D. G. Stearns and E. M. Gullikson, Physica B 283, 84 (2000).
4. D. L. Windt, R. Hull, and W. K. Waskiewicz, J. Appl. Phys. 71, 2675 (1992).
5. D. G. Stearns, M. B. Stearns, Y. Cheng, J. H. Stith, and N. M. Ceglio, J. Appl. Phys. 67, 2415 (1990).
6. A. K. Petford-Long, M. B. Stearns, C. H. Chang, S. R. Nutt, D. G. Stearns, N. M. Ceglio, and A. M. Hawryluk, J. Appl. Phys. 61, 1422 (1987).
7. C. Liu, R. Conley, A. Macrander, J. Maser, H. Kang, M. Zurbuchen, and G. Stephenson, J. Appl. Phys. 98, 113519 (2005).
8. H. Kang, J. Maser, G. Stephenson, C. Liu, R. Conley, A. Macrander, and S. Vogt, Phys. Rev. Lett. 96, 127401 (2006).
9. A.-L. Barabási and H. E. Stanley, Fractal Concepts in Surface Growth (Cambridge University Press, Cambridge, England, 1995).
10. Z. Zhang and M. G. Lagally, Science 276, 377 (1997).
11. A. T. Macrander, C. Liu, R. Csencsits, R. Cook, M. Kirk, and R. Headrick, Physica B 283, 157 (2000).
12. L. Peverini, E. Ziegler, T. Bigault, and I. Kozhevnikov, Phys. Rev. B 72, 045445 (2005).
13. M. Moseler, P. Gumbsch, C. Casiraghi, A. C. Ferrari, and J. Robertson, Science 309, 1545 (2005).
14. C. Casiraghi, A. C. Ferrari, R. Ohr, A. J. Flewitt, D. P. Chu, and J. Robertson, Phys. Rev. Lett. 91, 226104 (2003).
15. Z.-J. Liu and Y. G. Shen, Appl. Phys. Lett. 84, 5121 (2004).
16. R. Schlatmann, J. D. Shindler, and J. Verhoeven, Phys. Rev. B 54, 10880 (1996).
17. F. Family, J. Phys. A 18, L75 (1985).
18. S. D. Sarma and P. Tamborenea, Phys. Rev. Lett. 66, 325 (1991).
19. C. C. Umbach, R. L. Headrick, and K.-C. Chang, Phys. Rev. Lett. 87, 246104 (2001).
20. K. Oyoshi, T. Tagami, and S. Tanaka, Jpn. J. Appl. Phys., Part 1 30, 1854 (1991).
21. V. Rigato, Surf. Coat. Technol. 174-175, 40 (2003).
22. E. Spiller, Appl. Phys. Lett. 54, 2293 (1989).
23. B. Window, J. Vac. Sci. Technol. A 11, 1522 (1993).
24. J. A. Nielsen and D. McMorrow, Elements of Modern X-ray Physics (Wiley, England, 2001).
25. R. L. Headrick, S. Kycia, Y. K. Park, A. R. Woll, and J. D. Brock, Phys. Rev. B 54, 14686 (1996).
26. D. L. Windt, Comput. Phys. 12, 360 (1998).