Surface roughness and interface diffusion studies on thin Mo and W films and Mo/Si and W/Si interfaces

Applied Surface Science

Volumn 214, Issue 1-4, 2003, Pages 259-271

  Bhattacharyya, D ^a   Poswal, A K ^a   Senthilkumar, M ^a   Satyam, P V ^b   Balamurugan, A K ^c   Tyagi, A K ^c   Das, N C ^a  

^a BHABHA ATOMIC RESEARCH CENTRE   (India)

^b INSTITUTE OF PHYSICS   (India)

^c INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

Author keywords

Interface diffusion; SIMS; Spectroscopic ellipsometry; Surface roughness

Indexed keywords

DIFFUSION; ELLIPSOMETRY; INTERFACES (MATERIALS); PHASE MODULATION; SECONDARY ION MASS SPECTROMETRY; SURFACE ROUGHNESS; THIN FILMS; TUNGSTEN;

SPECTROSCOPIC ELLIPSOMETRY;

MOLYBDENUM;

EID: 0038209244     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00360-X     Document Type: Article

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