Nonspecular x-ray reflectivity study of roughness scaling in Si/Mo multilayers

Journal of Applied Physics

Volumn 89, Issue 2, 2001, Pages 1101-1107

  Freitag, J M ^a   Clemens, B M ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000159015     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1332095     Document Type: Article

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