Interface evolution in a W/Si multilayer after rapid thermal annealing studied by X-ray reflectivity and diffuse scattering

Journal of Applied Crystallography

Volumn 30, Issue 5 PART 2, 1997, Pages 642-646

  Jergel, M ^a   Holy V ^a   Majkova E ^a  

^a INSTITUTE OF CHEMISTRY   (Slovakia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001330737     PISSN: 00218898     EISSN: None     Source Type: Journal    
DOI: 10.1107/s0021889897001301     Document Type: Article

References (10)

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