Plasma-enhanced chemical vapour deposition of inorganic nanomaterials using a chloride precursor

Journal of Physics D: Applied Physics

Volumn 44, Issue 17, 2011, Pages

  Yang, Rong ^a   Zheng, Jie ^a   Li, Wei ^a   Qu, Jianglan ^a   Li, Xingguo ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; CHLORIDE PRECURSOR; FUTURE APPLICATIONS; INORGANIC NANOMATERIALS; NANO-MATERIALS; NANOMATERIAL; THERMODYNAMIC EFFECT;

CHLORINE COMPOUNDS; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS;

PLASMA DEPOSITION;

EID: 79954577461     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/44/17/174015     Document Type: Article

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