Preparation of rutile TiO2 thin films by mist plasma evaporation

Journal of Crystal Growth

Volumn 268, Issue 3-4 SPEC. ISS., 2004, Pages 564-567

  Huang, Hui ^a   Yao, Xi ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

A1. Surface structure; A3. Mist plasma evaporation; B1. Titanium dioxide

Indexed keywords

ATMOSPHERIC PRESSURE; DEPOSITION; EVAPORATION; FOG; INDUCTIVELY COUPLED PLASMA; MORPHOLOGY; OXIDATION; SOLUTIONS; STOICHIOMETRY; SURFACE STRUCTURE; TITANIUM DIOXIDE;

CARRIER GAS; FLOW RATE; MIST PLASMA EVAPORATION; PRECURSORS;

THIN FILMS;

EID: 3142725605     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.04.092     Document Type: Conference Paper

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