Atmospheric pressure chemical vapor deposition of crystalline monoclinic WO3 and WO3-x thin films from reaction of WCl6 with O-containing solvents and their photochromic and electrochromic properties

Chemistry of Materials

Volumn 17, Issue 6, 2005, Pages 1583-1590

  Blackman, Christopher S ^a   Parkin, Ivan P ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; ELECTROCHROMISM; GLASS; MORPHOLOGY; OXYGEN; PHOTOCATALYSIS; PHOTOCHROMISM; SOLVENTS; SUBSTRATES; THIN FILMS;

ELECTROCHROMIC PROPERTIES; ETHANOIC ANHYDRIDE; GLASS SUBSTRATES; REACTANTS;

TUNGSTEN COMPOUNDS;

2 PROPANOL; ACETIC ACID; ACETIC ANHYDRIDE; ALCOHOL; CRYSTALLIN; METHANOL; TERT BUTYL ALCOHOL; WATER;

ARTICLE; ATMOSPHERIC PRESSURE; CHEMICAL ANALYSIS; CHEMICAL PARAMETERS; CHEMICAL REACTION; FILM; PHOTOCATALYSIS; STRUCTURE ANALYSIS;

EID: 15444379716     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm0403816     Document Type: Article

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