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Volumn 17, Issue 6, 2005, Pages 1583-1590
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Atmospheric pressure chemical vapor deposition of crystalline monoclinic WO3 and WO3-x thin films from reaction of WCl6 with O-containing solvents and their photochromic and electrochromic properties
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Author keywords
[No Author keywords available]
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Indexed keywords
ATMOSPHERIC PRESSURE;
CHEMICAL VAPOR DEPOSITION;
CRYSTALLINE MATERIALS;
ELECTROCHROMISM;
GLASS;
MORPHOLOGY;
OXYGEN;
PHOTOCATALYSIS;
PHOTOCHROMISM;
SOLVENTS;
SUBSTRATES;
THIN FILMS;
ELECTROCHROMIC PROPERTIES;
ETHANOIC ANHYDRIDE;
GLASS SUBSTRATES;
REACTANTS;
TUNGSTEN COMPOUNDS;
2 PROPANOL;
ACETIC ACID;
ACETIC ANHYDRIDE;
ALCOHOL;
CRYSTALLIN;
METHANOL;
TERT BUTYL ALCOHOL;
WATER;
ARTICLE;
ATMOSPHERIC PRESSURE;
CHEMICAL ANALYSIS;
CHEMICAL PARAMETERS;
CHEMICAL REACTION;
FILM;
PHOTOCATALYSIS;
STRUCTURE ANALYSIS;
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EID: 15444379716
PISSN: 08974756
EISSN: None
Source Type: Journal
DOI: 10.1021/cm0403816 Document Type: Article |
Times cited : (170)
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References (36)
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