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Plasma Processes and Polymers

Volumn 2, Issue 1, 2005, Pages 16-37

Dry etching of electronic oxides, polymers, and semiconductors

(2) Pearton, Stephen J a Norton, David P a

a University of Florida (United States)

Author keywords

Dry etching; High density plasma; Inductively coupled; Ion assisted etching; Oxides

Indexed keywords

ASPECT RATIO; INDUCTIVELY COUPLED PLASMA; ION BEAMS; MAGNESIA; PHOTORESISTS; PLASMA ETCHING; PLASTIC FILMS; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SPUTTER DEPOSITION; ZINC OXIDE;

ELECTRONIC OXIDES; ION-INDUCED DISPLACEMENT DAMAGE; LOADING EFFECTS; PLASMA CHEMISTRIES; PLASMA RESIDUES; POLYMER DEPOSITION;

DRY ETCHING;

EID: 23044453779 PISSN: 16128850 EISSN: None Source Type: Journal
DOI: 10.1002/ppap.200400035 Document Type: Review

Times cited : (107)

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