Low temperature deposition and effect of plasma power on tin oxide thin films prepared by modified plasma enhanced chemical vapor deposition

Journal of Applied Physics

Volumn 102, Issue 7, 2007, Pages

  Ansari, S G ^a   Dar, M A ^a   Dhage, M S ^a   Kim, Young Soon ^a   Shin, Hyung Shik ^a   Ansari, Z A ^b  

^a Chonbuk National University   (South Korea)

^b JAMIA MILLIA ISLAMIA CENTRAL UNIVERSITY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; LOW TEMPERATURE EFFECTS; PLASMAS; RADIO FREQUENCY AMPLIFIERS; TIN OXIDES;

CRYSTALLINITY; DEPOSITION TEMPERATURE; PLASMA POWER; TETRAGONAL RUTILE STRUCTURES;

THIN FILMS;

EID: 35348813733     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2786612     Document Type: Article

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