Preparation and characterization of rutile TiO2 thin films by mist plasma evaporation

Surface and Coatings Technology

Volumn 191, Issue 1, 2005, Pages 54-58

  Huang, Hui ^a   Yao, Xi ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

Plasma processing and deposition; Surface morphology; Titanium oxide

Indexed keywords

EVAPORATION; GRAIN SIZE AND SHAPE; MORPHOLOGY; PLASMA APPLICATIONS; SUBSTRATES; THIN FILMS;

MIST PLASMA EVAPORATION (MPE); PRECURSORS;

TITANIUM DIOXIDE;

PLASMA TREATMENT;

EID: 10244279240     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.04.073     Document Type: Article

References (23)

1. Vinodgopal K. Hotchandani S. Kamat P.V. J. Phys. Chem. 97 1993 9040
2. Ye Y.H. Zhang J.Y. Gu P.F. Liu X. Tang J.F. Thin Solid Films 298 1997 197
3. Huang S.Y. Kavan L. Exnar I. Gratzel M. J. Electrochem. Soc. 142 1995 L142
4. Gauthier V. Bourgeois S. Sibillot P. Maglione M. Sacilotti M. Thin Solid Films 340 1999 175
5. Gao Y. Chambers S.A. J. Mater. Res. 11 1996 1025
6. Natarajan C. Fukunaga N. Nogami G. Thin Solid Films 322 1998 6
7. Kaliwoh N. Zhang J.Y. Boyd I.W. Surf. Coat. Technol. 125 1999 424
8. Huang H. Luo H.J. Yao X. Acta Phys. Sin. 51 2002 1881 (in Chinese)
9. Huang H. Yao X. Wang M.Q. Wu X.Q. J. Cryst. Growth 263 2004 406
10. H. Huang, X. Yao, Ceram. Int. (in press).
11. H. Huang, X. Yao, Thin Solid Films (in press).
12. Suzuki M. Kagawa M. Syono Y. Hirai T. J. Cryst. Growth 99 1990 611
13. Suzuki M. Kagawa M. Syono Y. Hirai T. J. Cryst. Growth 112 1991 621
14. Ichinose H. Nagano M. Katsuki H. Takagi H. J. Mater. Sci. 29 1994 5109
15. Ichinose H. Nagano M. Katsuki H. Takagi H. J. Mater. Sci. 29 1994 5115
16. Lee D.H. Vuong K.D. Williams J.A.A. Fagan J. Condrate R.A.Sr. Wang X.W. J. Mater. Res. 11 1996 895
17. Moss R.W. Lee D.H. Vuong K.D. Condrate R.A.Sr. Wang X.W. DeMarco M. Stuckey J. J. Non-Cryst. Solids 218 1997 105
18. Norio Y. Tomoyuki H. Kazuo T. Toyonobu Y. Thin Solid Films 316 1998 185
19. Nagata S. Wakiya N. Masuda Y. Adachi S. Tanabe K. Sakurai O. Funakubo H. Shinozaki K. Mizutani N. Thin Solid Films 334 1998 87
20. Huang H. Yao X. Wang M.Q. Wu X.Q. Piezoelectrics & Acoustooptics 26 2004 62 (in Chinese)
21. Dannenberg R. Greene P. Thin Solid Films 360 2000 122
22. Wagner C.D. Riggs W.M. Davis L.E. Moulder J.F. Muilenberg G.E. Handbook of X-ray Photoelectron Spectroscopy 1979 Perkin-Elmer Eden Prairie, MN
23. Terashima K. Komaki H. Toshida T. IEEE Trans. Plasma Sci. 18 1990 980