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Volumn 7, Issue 5, 2011, Pages 563-567

Seeding of silicon wire growth by out-diffused metal precipitates

(7) Ganapati, Vidya a Fenning, David P a Bertoni, Mariana I a Kendrick, Chito E b Fecych, Alexandria E a Redwing, Joan M b Buonassisi, Tonio a

a Massachusetts Institute of Technology Cambridge (United States)

b PENNSYLVANIA STATE UNIVERSITY (United States)

Author keywords

bulk diffusion; metal catalyst; microwires; surface precipitation; vapor liquid solid method

Indexed keywords

BULK DIFFUSIONS; METAL CATALYST; MICROWIRES; SURFACE PRECIPITATION; VAPOR-LIQUID-SOLID METHOD;

CATALYSTS; DROPS; LIQUIDS; METALS; PRECIPITATES; VAPORS; WIRE PRODUCTS;

PRECIPITATION (CHEMICAL);

METAL; METAL NANOPARTICLE; SILICON;

ARTICLE; CATALYSIS; CHEMISTRY; NANOTECHNOLOGY; TEMPERATURE; ULTRASTRUCTURE;

CATALYSIS; METAL NANOPARTICLES; METALS; NANOTECHNOLOGY; SILICON; TEMPERATURE;

EID: 79952228770 PISSN: 16136810 EISSN: 16136829 Source Type: Journal
DOI: 10.1002/smll.201002250 Document Type: Article

Times cited : (3)

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