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Volumn 10, Issue 3, 2010, Pages 1050-1054

Direct growth of nanowire logic gates and photovoltaic devices

Author keywords

Direct growth of nanowire devices; Epitaxial growth; Logic gates; Nanowires; Photovoltaics

Indexed keywords

BUILDING BLOCKES; CLOSE PROXIMITY; CRITICAL CHALLENGES; DIRECT GROWTH; ELECTRODE DESIGN; FUNCTIONAL DEVICES; LARGE SCALE INTEGRATED SYSTEMS; NANOWIRE DEVICES; PHOTOVOLTAIC DEVICES; PHOTOVOLTAICS; PHYSICAL AND CHEMICAL PROPERTIES; POWER OUT PUT; RECTIFYING BEHAVIORS; SYNTHESIS CONDITIONS;

EID: 77949480681     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl100011z     Document Type: Article
Times cited : (32)

References (27)
  • 16
    • 84885894195 scopus 로고    scopus 로고
    • note
    • 17Hence, the distance between the electrodes is designed to be large enough to prevent secondary NWs from reaching the opposite electrode.
  • 19
    • 84885894234 scopus 로고    scopus 로고
    • note
    • 2.
  • 22
    • 84885894223 scopus 로고    scopus 로고
    • note
    • o is the saturation current.
  • 23
    • 84885894237 scopus 로고    scopus 로고
    • note
    • In the logic gate testing, a 25 MQ external resistor was added for the measurement to make the resistance of the p-type SiNW resistors comparable to the resistance of the diodes .
  • 26
    • 84885894194 scopus 로고    scopus 로고
    • note
    • 22 The saturation current was 354.0 fA, the series resistance was 370.2 kΩ, and the shunt resistance was 159.9 GΩ .


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.