Repeated epitaxial growth and transfer of arrays of patterned, vertically aligned, crystalline Si wires from a single Si(111) substrate

Applied Physics Letters

Volumn 93, Issue 3, 2008, Pages

  Spurgeon, Joshua M ^a   Plass, Katherine E ^a   Kayes, Brendan M ^a   Brunschwig, Bruce S ^a   Atwater, Harry A ^a   Lewis, Nathan S ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CANNING; COPPER PLATING; EPITAXIAL GROWTH; FILM GROWTH; MOLECULAR BEAM EPITAXY; PLASTIC FILMS; POLYMER FILMS; POLYMERS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SUBSTRATES; WIRE;

AMERICAN INSTITUTE OF PHYSICS (AIP); ARRAY STRUCTURES; CRYSTALLINE SI (C SI); FILM TRANSFER; FLEXIBLE POLYMER FILM; MULTIPLE ARRAYS; PATTERNED SUBSTRATES; SI (111); SI WAFER; SI(2 1 1) SUBSTRATES; VERTICALLY ALIGNED; WIRE ARRAYS;

SILICON WAFERS;

EID: 48249091347     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2959184     Document Type: Article

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