Surface texturing of Si, porous Si and TiO 2 by laser ablation

Applied Surface Science

Volumn 253, Issue 15, 2007, Pages 6575-6579

  Mills, D ^a   Kreouzis, T ^a   Sapelkin, A ^a   Unal, B ^a   Zyuzikov, N ^a   Kolasinski, K W ^b  

^a QUEEN MARY UNIVERSITY OF LONDON   (United Kingdom)

^b WEST CHESTER UNIVERSITY   (United States)

Author keywords

Laser ablation; Pillar; Silicon and porous silicon; Surface texturing; TiO 2

Indexed keywords

BIOTECHNOLOGY; CRYSTAL GROWTH; EXCIMER LASERS; LASER ABLATION; NANOCRYSTALS; OPTOELECTRONIC DEVICES; POROUS SILICON; SURFACE ROUGHNESS; TITANIUM OXIDES;

CONICAL PILLARS; SILICON AND POROUS SILICON; SURFACE TEXTURING;

SURFACE PROPERTIES;

EID: 34247595433     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.01.078     Document Type: Article

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