-
1
-
-
9744248669
-
-
NATUAS 0028-0836,. 10.1038/nature03090
-
K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano, and H. Hosono, Nature (London) NATUAS 0028-0836, 432, 488 (2004). 10.1038/nature03090
-
(2004)
Nature (London)
, vol.432
, pp. 488
-
-
Nomura, K.1
Ohta, H.2
Takagi, A.3
Kamiya, T.4
Hirano, M.5
Hosono, H.6
-
2
-
-
0038362743
-
-
SCIEAS 0036-8075,. 10.1126/science.1083212
-
K. Nomura, H. Ohta, K. Ueda, T. Kamiya, M. Hiran o, and H. Hosono1, Science SCIEAS 0036-8075, 300, 1269 (2003). 10.1126/science.1083212
-
(2003)
Science
, vol.300
, pp. 1269
-
-
Nomura, K.1
Ohta, H.2
Ueda, K.3
Kamiya, T.4
Hiran, O.M.5
Hosono, H.6
-
3
-
-
77649122278
-
-
IJDTAL 1551-319X,. 10.1109/JDT.2009.2021582
-
T. Kamiya, K. Nomura, and H. Hosono, J. Disp. Technol. IJDTAL 1551-319X, 5, 273 (2009). 10.1109/JDT.2009.2021582
-
(2009)
J. Disp. Technol.
, vol.5
, pp. 273
-
-
Kamiya, T.1
Nomura, K.2
Hosono, H.3
-
4
-
-
67650474594
-
-
APPLAB 0003-6951,. 10.1063/1.3159831
-
K. Nomura, T. Kamiya, M. Hirano, and H. Hosono, Appl. Phys. Lett. APPLAB 0003-6951, 95, 013502 (2009). 10.1063/1.3159831
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 013502
-
-
Nomura, K.1
Kamiya, T.2
Hirano, M.3
Hosono, H.4
-
5
-
-
41649084966
-
-
APPLAB 0003-6951,. 10.1063/1.2904704
-
M. Kimura, T. Nakanishi, K. Nomura, T. Kamiya, and H. Hosono, Appl. Phys. Lett. APPLAB 0003-6951, 92, 133512 (2008). 10.1063/1.2904704
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 133512
-
-
Kimura, M.1
Nakanishi, T.2
Nomura, K.3
Kamiya, T.4
Hosono, H.5
-
6
-
-
69049119241
-
-
APPLAB 0003-6951,. 10.1063/1.3187532
-
M. E. Lopes, H. L. Gomes, M. C. R. Medeiros, P. Barquinha, L. Pereira, E. Fortunato, R. Martins, and I. Ferreira, Appl. Phys. Lett. APPLAB 0003-6951, 95, 063502 (2009). 10.1063/1.3187532
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 063502
-
-
Lopes, M.E.1
Gomes, H.L.2
Medeiros, M.C.R.3
Barquinha, P.4
Pereira, L.5
Fortunato, E.6
Martins, R.7
Ferreira, I.8
-
7
-
-
59349097224
-
-
JESOAN 0013-4651,. 10.1149/1.3049819
-
P. Barquinha, L. Pereira, G. Goņalves, R. Martins, and E. Fortunato, J. Electrochem. Soc. JESOAN 0013-4651, 156, H161 (2009). 10.1149/1.3049819
-
(2009)
J. Electrochem. Soc.
, vol.156
, pp. 161
-
-
Barquinha, P.1
Pereira, L.2
Goņalves, G.3
Martins, R.4
Fortunato, E.5
-
8
-
-
39749191514
-
-
APPLAB 0003-6951,. 10.1063/1.2838380
-
J.-S. Park, J. K. Jeong, H.-J. Chung, Y.-G. Mo, and H. D. Kim, Appl. Phys. Lett. APPLAB 0003-6951, 92, 072104 (2008). 10.1063/1.2838380
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 072104
-
-
Park, J.-S.1
Jeong, J.K.2
Chung, H.-J.3
Mo, Y.-G.4
Kim, H.D.5
-
9
-
-
56249144477
-
-
APPLAB 0003-6951,. 10.1063/1.3020714
-
K. Nomura, T. Kamiya, H. Ohta, Masahiro Hirano, and H. Hosono, Appl. Phys. Lett. APPLAB 0003-6951, 93, 192107 (2008). 10.1063/1.3020714
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 192107
-
-
Nomura, K.1
Kamiya, T.2
Ohta, H.3
Hirano, M.4
Hosono, H.5
-
10
-
-
59649110307
-
-
JJAPA5 0021-4922,. 10.1143/JJAP.48.010203
-
K. Takechi, M. Nakata, T. Eguchi, H. Yamaguchi, and S. Kaneko, Jpn. J. Appl. Phys. JJAPA5 0021-4922, 48, 010203 (2009). 10.1143/JJAP.48.010203
-
(2009)
Jpn. J. Appl. Phys.
, vol.48
, pp. 010203
-
-
Takechi, K.1
Nakata, M.2
Eguchi, T.3
Yamaguchi, H.4
Kaneko, S.5
-
11
-
-
67650483313
-
-
APPLAB 0003-6951,. 10.1063/1.3159832
-
J.-S. Park, T.-W. Kim, D. Stryakhilev, J.-S. Lee, S.-G. An, Y.-S. Pyo, D.-B. Lee, Y. G. Mo, D.-U. Jin, and H. K. Chung, Appl. Phys. Lett. APPLAB 0003-6951, 95, 013503 (2009). 10.1063/1.3159832
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 013503
-
-
Park, J.-S.1
Kim, T.-W.2
Stryakhilev, D.3
Lee, J.-S.4
An, S.-G.5
Pyo, Y.-S.6
Lee, D.-B.7
Mo, Y.G.8
Jin, D.-U.9
Chung, H.K.10
-
12
-
-
62149105782
-
-
APPLAB 0003-6951,. 10.1063/1.3095505
-
S.-J. Liu, H.-W. Fang, S.-H. Su, C.-H. Li, J.-S. Cherng, J.-H. Hsieh, and J.-Y. Juang, Appl. Phys. Lett. APPLAB 0003-6951, 94, 092504 (2009). 10.1063/1.3095505
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 092504
-
-
Liu, S.-J.1
Fang, H.-W.2
Su, S.-H.3
Li, C.-H.4
Cherng, J.-S.5
Hsieh, J.-H.6
Juang, J.-Y.7
-
13
-
-
54549120323
-
-
DTPSDS 0003-966X,. 10.1889/1.3069740
-
J.-H. Lee, D.-H. Kim, D.-J. Yang, S.-Y. Hong, K.-S. Yoon, P.-S. Hong, C.-O. Jeong, H.-S. Park, S. Y. Kim, S. K. Lim, SID Int. Symp. Digest Tech. Papers DTPSDS 0003-966X, 39, 625 (2008). 10.1889/1.3069740
-
(2008)
SID Int. Symp. Digest Tech. Papers
, vol.39
, pp. 625
-
-
Lee, J.-H.1
Kim, D.-H.2
Yang, D.-J.3
Hong, S.-Y.4
Yoon, K.-S.5
Hong, P.-S.6
Jeong, C.-O.7
Park, H.-S.8
Kim, S.Y.9
Lim, S.K.10
-
14
-
-
41549139209
-
-
JVTBD9 1071-1023,. 10.1116/1.2839860
-
M. K. Jayaraja, K. J. Saji, K. Nomura, T. Kamiya, and H. Hosono, J. Vac. Sci. Technol. B JVTBD9 1071-1023, 26, 495 (2008). 10.1116/1.2839860
-
(2008)
J. Vac. Sci. Technol. B
, vol.26
, pp. 495
-
-
Jayaraja, M.K.1
Saji, K.J.2
Nomura, K.3
Kamiya, T.4
Hosono, H.5
-
15
-
-
13544269370
-
-
APPLAB 0003-6951,. 10.1063/1.1843286
-
H. Q. Chiang, J. F. Wager, R. L. Hoffman, J. Jeong, and D. A. Keszler, Appl. Phys. Lett. APPLAB 0003-6951, 86, 013503 (2005). 10.1063/1.1843286
-
(2005)
Appl. Phys. Lett.
, vol.86
, pp. 013503
-
-
Chiang, H.Q.1
Wager, J.F.2
Hoffman, R.L.3
Jeong, J.4
Keszler, D.A.5
-
16
-
-
33846965196
-
-
APPLAB 0003-6951,. 10.1063/1.2458457
-
P. Görrn, P. Hölzer, T. Riedl, W. Kowalsky, J. Wang, T. Weimann, P. Hinze, and S. Kipp, Appl. Phys. Lett. APPLAB 0003-6951, 90, 063502 (2007). 10.1063/1.2458457
-
(2007)
Appl. Phys. Lett.
, vol.90
, pp. 063502
-
-
Görrn, P.1
Hölzer, P.2
Riedl, T.3
Kowalsky, W.4
Wang, J.5
Weimann, T.6
Hinze, P.7
Kipp, S.8
-
17
-
-
33744918047
-
-
SSELA5 0038-1101,. 10.1016/j.sse.2006.03.004
-
R. L. Hoffman, Solid-State Electron. SSELA5 0038-1101, 50, 784 (2006). 10.1016/j.sse.2006.03.004
-
(2006)
Solid-State Electron.
, vol.50
, pp. 784
-
-
Hoffman, R.L.1
-
18
-
-
70449711200
-
-
APPLAB 0003-6951,. 10.1063/1.3262962
-
P. T. Erslev, E. S. Sundholm, R. E. Presley, D. Hong, J. F. Wager, and J. D. Cohen, Appl. Phys. Lett. APPLAB 0003-6951, 95, 192115 (2009). 10.1063/1.3262962
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 192115
-
-
Erslev, P.T.1
Sundholm, E.S.2
Presley, R.E.3
Hong, D.4
Wager, J.F.5
Cohen, J.D.6
-
19
-
-
54549110006
-
-
DTPSDS 0003-966X.
-
G. H. Kim, H. S. Shin, K. H. Kim, W. J. Park, Y. J. Choi, B. D. Ahn, and H. J. Kim, SID Int. Symp. Digest Tech. Papers DTPSDS 0003-966X, 1258 (2008).
-
(2008)
SID Int. Symp. Digest Tech. Papers
, vol.1258
-
-
Kim, G.H.1
Shin, H.S.2
Kim, K.H.3
Park, W.J.4
Choi, Y.J.5
Ahn, B.D.6
Kim, H.J.7
-
20
-
-
70349929799
-
-
LANGD5 0743-7463,. 10.1021/la901436p
-
D. Kim, Y. Jeong, K. Song, S.-K. Park, G. Cao, and J. Moon, Langmuir LANGD5 0743-7463, 25, 11149 (2009). 10.1021/la901436p
-
(2009)
Langmuir
, vol.25
, pp. 11149
-
-
Kim, D.1
Jeong, Y.2
Song, K.3
Park, S.-K.4
Cao, G.5
Moon, J.6
-
21
-
-
69149104577
-
-
ESLEF6 1099-0062,. 10.1149/1.3119037
-
S. K. Park, Y.-H. Kim, H.-S. Kim, and J.-I. Han, Electrochem. Solid-State Lett. ESLEF6 1099-0062, 12, H256 (2009). 10.1149/1.3119037
-
(2009)
Electrochem. Solid-State Lett.
, vol.12
, pp. 256
-
-
Park, S.K.1
Kim, Y.-H.2
Kim, H.-S.3
Han, J.-I.4
-
22
-
-
78249268197
-
-
10.1021/am900787k
-
Y. Jeong, C. Bae, D. Kim, K. Song, K. Woo, H. Shin, G. Cao, and J. Moon, App. Mater. Interfaces, 2, 611 (2010). 10.1021/am900787k
-
(2010)
App. Mater. Interfaces
, vol.2
, pp. 611
-
-
Jeong, Y.1
Bae, C.2
Kim, D.3
Song, K.4
Woo, K.5
Shin, H.6
Cao, G.7
Moon, J.8
-
23
-
-
63649106046
-
-
JPAPBE 0022-3727,. 10.1088/0022-3727/42/3/035106
-
S. J. Seo, C. G. Choi, Y. H. Hwang, and B.-S. Bae, J. Phys. D JPAPBE 0022-3727, 42, 035106 (2009). 10.1088/0022-3727/42/3/035106
-
(2009)
J. Phys. D
, vol.42
, pp. 035106
-
-
Seo, S.J.1
Choi, C.G.2
Hwang, Y.H.3
Bae, B.-S.4
-
24
-
-
33947313009
-
-
ESLEF6 1099-0062,. 10.1149/1.2666588
-
Y.-J. Chang, D.-H. Lee, G. S. Herman, and C.-H. Chang, Electrochem. Solid-State Lett. ESLEF6 1099-0062, 10, H135 (2007). 10.1149/1.2666588
-
(2007)
Electrochem. Solid-State Lett.
, vol.10
, pp. 135
-
-
Chang, Y.-J.1
Lee, D.-H.2
Herman, G.S.3
Chang, C.-H.4
-
25
-
-
70349742574
-
-
JESOAN 0013-4651,. 10.1149/1.3212847
-
Y. Jeong, K. Song, D. Kim, C. Y. Koo, and J. Moon, J. Electrochem. Soc. JESOAN 0013-4651, 156, H808 (2009). 10.1149/1.3212847
-
(2009)
J. Electrochem. Soc.
, vol.156
, pp. 808
-
-
Jeong, Y.1
Song, K.2
Kim, D.3
Koo, C.Y.4
Moon, J.5
-
26
-
-
77950192258
-
-
ADVMEW 0935-9648,. 10.1002/adma.200902450
-
S. Jeong, Y.-G. Ha, J. Moon, A. Facchetti, and T. J. Marks, Adv. Mater. ADVMEW 0935-9648, 22, 1346 (2010). 10.1002/adma.200902450
-
(2010)
Adv. Mater.
, vol.22
, pp. 1346
-
-
Jeong, S.1
Ha, Y.-G.2
Moon, J.3
Facchetti, A.4
Marks, T.J.5
-
27
-
-
77953169466
-
-
JJAPA5 0021-4922,. 10.1143/JJAP.49.05EB06
-
D. Kim, Y. Jeong, C. Y. Koo, K. Song, and J. Moon, Jpn. J. Appl. Phys. JJAPA5 0021-4922, 49, 05EB06 (2010). 10.1143/JJAP.49.05EB06
-
(2010)
Jpn. J. Appl. Phys.
, vol.49
-
-
Kim, D.1
Jeong, Y.2
Koo, C.Y.3
Song, K.4
Moon, J.5
-
28
-
-
77949660226
-
-
APPLAB 0003-6951,. 10.1063/1.3357434
-
Y.-T. Chen, H. Zhao, Y. Wang, F. Xue, F. Zhou, and J. C. Lee, Appl. Phys. Lett. APPLAB 0003-6951, 96, 103506 (2010). 10.1063/1.3357434
-
(2010)
Appl. Phys. Lett.
, vol.96
, pp. 103506
-
-
Chen, Y.-T.1
Zhao, H.2
Wang, Y.3
Xue, F.4
Zhou, F.5
Lee, J.C.6
-
29
-
-
67650369791
-
-
TDIMD5 0163-1918.
-
W.-C. Wu, C.-S. Lai, S.-C. Lee, M.-W. Ma, T.-S. Chao, J.-C. Wang, C.-W. Hsu, P.-C. Chou, J.-H. Chen, K.-H. Kao, Tech. Dig.-Int. Electron Devices Meet. TDIMD5 0163-1918, 2008, 405.
-
Tech. Dig. - Int. Electron Devices Meet.
, vol.2008
, pp. 405
-
-
Wu, W.-C.1
Lai, C.-S.2
Lee, S.-C.3
Ma, M.-W.4
Chao, T.-S.5
Wang, J.-C.6
Hsu, C.-W.7
Chou, P.-C.8
Chen, J.-H.9
Kao, K.-H.10
-
30
-
-
33846999647
-
-
APPLAB 0003-6951,. 10.1063/1.2437684
-
D. H. Song, M. H. Choi, J. Y. Kim, and J. Jang, Appl. Phys. Lett. APPLAB 0003-6951, 90, 053504 (2007). 10.1063/1.2437684
-
(2007)
Appl. Phys. Lett.
, vol.90
, pp. 053504
-
-
Song, D.H.1
Choi, M.H.2
Kim, J.Y.3
Jang, J.4
|