|
Volumn 48, Issue 1, 2009, Pages
|
Comparison of ultraviolet photo-field effects between hydrogenated amorphous silicon and amorphous InGaZnO4 thin-film transistors
a a a b b
b
NEC CORPORATION
(Japan)
|
Author keywords
[No Author keywords available]
|
Indexed keywords
HYDROGENATION;
SEMICONDUCTING ORGANIC COMPOUNDS;
THIN FILM DEVICES;
THIN FILM TRANSISTORS;
TRANSISTORS;
A-SI:H;
CURRENT INCREASE;
FIELD EFFECTS;
HYDROGENATED AMORPHOUS SILICONS;
INITIAL STATE;
PHOTO RESPONSE;
QUALITATIVE MODELS;
ULTRA VIOLETS;
UV ILLUMINATIONS;
UV LIGHTS;
AMORPHOUS SILICON;
|
EID: 59649110307
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.48.010203 Document Type: Article |
Times cited : (139)
|
References (13)
|