Raman studies on nanocomposite silicon carbonitride thin film deposited by r.f. magnetron sputtering at different substrate temperatures

Journal of Raman Spectroscopy

Volumn 41, Issue 10, 2010, Pages 1234-1239

  Bhattacharyya, Arnab Sankar ^a   Mishra, Suman Kumari ^a  

^a NATIONAL METALLURGICAL LABORATORY   (India)

Author keywords

Nanocomposite SiCN thin film; Raman spectroscopy; Sputtering

Indexed keywords

CARBON; FILM GROWTH; MAGNETRON SPUTTERING; NANOCOMPOSITE FILMS; NANOCOMPOSITES; NITROGEN COMPOUNDS; RAMAN SPECTROSCOPY; SILICON COMPOUNDS; SUBSTRATES;

DIFFERENT SUBSTRATES; GRAPHITIC PHASE; NANOCOMPOSITE SICN THIN FILM; R.F. MAGNETRON SPUTTERING; RAMAN STUDIES; RF-MAGNETRON SPUTTERING; SILICON CARBO-NITRIDE; SPUTTERING; SUBSTRATES TEMPERATURE; THIN-FILMS;

THIN FILMS;

EID: 78751474771     PISSN: 03770486     EISSN: 10974555     Source Type: Journal    
DOI: 10.1002/jrs.2588     Document Type: Article

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