Deposition of nanostructured Si-C-N superhard coatings by rf magnetron sputtering

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 3, 2006, Pages 1311-1317

  Mishra, S K ^a   Gaur, H ^a   Rupa, P K P ^a   Pathak, L C ^a  

^a NATIONAL METALLURGICAL LABORATORY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COATINGS; CRYSTALLIZATION; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; NITROGEN; SILICON; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

GRAPHITIC PHASE FORMATION; LOCALIZED CRYSTALLIZATION; PARTICLE SIZE; SILICON-CARBON-NITRIDE FILMS;

THIN FILMS;

EID: 33744822751     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2200377     Document Type: Article

References (13)

1. R. Riedel, H. J. Kleebe, H. Schonfelder, and F. Aldinger, Nature (London) 374, 526 (1995).
2. L. C. Chen et al., Appl. Phys. Lett. 72, 2463 (1998).
3. A. Y. Liu and M. L. Cohen, Science 245, 841 (1989).
4. H. L. Chang and C. T. Kuo, Mater. Chem. Phys. 2, 236 (2001).
5. H. L. Chang and C. T. Kuo, Diamond Relat. Mater. 10, 1910 (2001).
6. Fu. Yongqing, S. Q. Chang, D. Hejun, and Y. Bibo, Surf. Coat. Technol. 160, 165 (2002).
7. A. Badzian, T. Badzain, W. D. Drawl, and R. Roy, Diamond Relat. Mater. 1, 80 (1998).
8. C. Uslu, B. Park, and D. B. Poker, J. Electron. Mater. 25, 23 (1996).
9. W. Cheng, J. Jiang, Y. Zhang, H. Zhu, and D. Shen, Mater. Chem. Phys. 85, 370 (2004).
10. J. Vleck, M. Kormunda, J. Cizek, V. Perina, and J. Zemek, Surf. Coat. Technol. 160, 74 (2002).
11. W. Chen, B. Zhou, Y. W. Chung, C. S. Lee, and S. T. Lee, J. Vac. Sci. Technol. A 16, 1907 (1998).
12. E. Kroke, Y. Li-Li, C. Konetschney, and E. Lecomte, Mater. Sci. Eng., R. 26, 97 (2000).
13. R. Riedel and W. Dressler, Ceram. Int. 22, 233 (1996).