A comparative study of Si-C-N films on different substrates grown by RF magnetron sputtering

Journal of Alloys and Compounds

Volumn 478, Issue 1-2, 2009, Pages 474-478

  Bhattacharyya, A S ^a,b   Mishra, S K ^a   Mukherjee, S ^b   Das, G C ^b  

^a NATIONAL METALLURGICAL LABORATORY   (India)

^b JADAVPUR UNIVERSITY   (India)

Author keywords

RF sputtering; Si C N; Substrate effect

Indexed keywords

ADHESION STUDIES; AMORPHOUS SI; C-N FILMS; COMPARATIVE STUDIES; DIFFERENT SUBSTRATES; MICRO INDENTATIONS; MICRO-STRUCTURAL CHARACTERIZATIONS; N MATRIXES; NANOCOMPOSITE THIN FILMS; RADIO FREQUENCY MAGNETRON SPUTTERING; RF SPUTTERING; RF- MAGNETRON SPUTTERING; SCRATCH TESTS; SI-C-N; SUBSTRATE EFFECT; TEM; THERMAL MISMATCHES; X-RAY PHOTOELECTRON SPECTROSCOPIES;

ADHESION; AMORPHOUS SILICON; BOROSILICATE GLASS; HARDNESS; MAGNETRON SPUTTERING; MAGNETRONS; MECHANICAL PROPERTIES; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SPECTRUM ANALYSIS; STAINLESS STEEL; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

SUBSTRATES;

EID: 67349262773     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2008.11.105     Document Type: Article

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